Nanofabrication
AssigneeUniversity of Massachusetts
InventorsMark Tuominen, Mustafa Bal, Thomas P. Russell, Andrei Ursache
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Abstract
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
Claims28
A method of interfacing an electrical connection with a multilayer nanostructure, the method comprising:
- preparing a diblock copolymer layer on a substrate surface, wherein the diblock copolymer layer comprises a matrix component and a core component, and at least a portion of the substrate surface is conductive or semiconductive;
- depositing a metal layer on at least a portion of the diblock copolymer layer;
- orienting the core component of the diblock copolymer layer to form a plurality of nanoscopic cylinders parallel to each other within the diblock copolymer layer and oriented with respect to the substrate surface;
- removing at least a portion of the oriented core component from the diblock copolymer layer to form a patterned array of nanopores in the diblock copolymer layer, wherein the diblock copolymer layer comprises a first region comprising nanopores and a second region comprising no nanopores to form the patterned array of nanopores;
- and
- at least partially filling at least some of the nanopores with a material.
Dependencies are inferred from the claim text.