Photonic MEMS and structures

A system configured to determine residual stress, comprising:

• one or more test structures, each test structure comprising a reflective membrane comprising a portion of a deposited film, wherein the test structure behaves in a manner according to the residual stress of the membrane and modulates light indicative of the degree of residual stress in the deposited film;
• an imaging system positionable to receive modulated light reflecting from the one or more test structures and produce an image associated with the received light;
• and
• a computer in communication with the imaging system, the computer configured to process the image and generate information relating to the residual stress of the deposited film.

A method of determining residual stress, the method comprising:

• interferometrically modulating light with a reflective membrane of a test structure, wherein the membrane behaves in a manner according to the residual stress of the test structure and modulates light indicative of the degree of residual stress;
• receiving the modulated light;
• and
• determining the residual stress of the test structure based on the received modulated light.

A method of determining residual stress in a deposited film, the method comprising:

• collecting a first set of data indicating a first residual stress state of the one or more test structures disposed on a substrate;
• depositing a film over the one or more test structures;
• collecting a second set of data indicating a second residual stress state of the one or more test structures, the second set of data indicating residual stress in the deposited film;
• and
• determining the residual stress of the deposited film based on comparing the collected first data and collected second data.

A system configured to determine residual stress in a deposited film, comprising:

• means for interferometrically modulating light according to the degree of residual stress of the deposited film;
• means for receiving the modulated light;
• and
• means for determining the residual stress of the test structure based on the received modulated light.