Apparatus for providing gas to a processing chamber
AssigneeApplied Materials, Inc.
InventorsSeshadri Ganguli, Ling Chen, Vincent W. Ku
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Abstract
An apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precursor material is adapted to produce a gas vapor when heated to a defined temperature at a defined pressure. The baffle forces a carrier gas to travel an extended mean path between the inlet and outlet ports. In another embodiment, an apparatus for generating gas includes a canister having a tube that directs a carrier gas flowing into the canister away from a precursor material disposed within the canister.
Claims38
Apparatus for generating gas for a semiconductor processing system, comprising:
- a canister having a sidewall, a top and a bottom defining an interior volume, the interior volume having an upper region and a lower region;
- an inlet port and an outlet port formed through the top of the canister and in communication with the upper region;
- at least one baffle disposed within the upper region of the canister and creating a tortuous flow path between the inlet port and the outlet port;
- and
- a precursor material at least partially filling the lower region of the canister.
Apparatus for generating gas for a semiconductor processing system, comprising:
- a canister having a sidewall, a top and a bottom defining an interior volume, the interior volume having an upper region and a lower region;
- an inlet port and an outlet port formed through the top of the canister and in communication with the upper region;
- and
- a tube having a first end coupled to the inlet port and a second end terminating in the upper region of the canister;
- and
- an aperture formed in the second end of the tube orientated towards a sidewall of the canister.
Apparatus for generating gas for a processing system, comprising:
- a canister having a sidewall, a top and a bottom defining an interior volume, the interior volume having an upper region and a lower region;
- an inlet port and an outlet port formed through the top of the canister and in communication with the upper region;
- a first valve coupled to the inlet port;
- and
- a second valve coupled to the outlet port, the first and second valves fitted with mating disconnect fittings for modular removal of the apparatus from a semiconductor process gas delivery system;
- a tube having a first end coupled to the inlet port and a second end terminating in the upper region of the canister, wherein the second end is angled from about 15 degrees to about 90 degrees relative to a center axis of the canister;
- and
- a plurality of baffles disposed within the upper region of the canister and creating a tortuous flow path between the inlet port and the outlet port.
Dependencies are inferred from the claim text.