Method and apparatus for data stackification for run-to-run control
AssigneeAdvanced Micro Devices, Inc.
InventorsChristopher A. Bone, Anthony J. Toprac
Life of this patent
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Abstract
A method and an apparatus for organizing production data is provided. The method comprises performing at least one process run of semiconductor devices, and recording at least one manufacturing tag associated with the process run of semiconductor devices. The method further comprises performing metrology upon at least one process run of the semiconductor device for acquiring metrology data and for performing a metrology data stackification process upon the metrology data using the manufacturing tag for organizing and stacking the metrology data. The method further comprises modifying at least one control parameter is modified based upon the stacked metrology data.
Claims22
A system, comprising:
- a processing tool for processing a production run of semiconductor wafers;
- a metrology tool operatively coupled with said processing tool and being capable of acquiring metrology data relating to said processed semiconductor wafers;
- a computer system operatively coupled with said processing tool and said metrology tool, said computer system being capable of controlling stacking, directing, and storing metrology data bi-directionally, said computer system comprising a control parameter filter unit being capable of filtering metrology data;
- and
- a manufacturing model operatively coupled with said computer system and said processing tool, said manufacturing model being capable of modifying control parameters in response to said filtering data for controlling said processing tool.
A system, comprising:
- a metrology tool being capable of acquiring metrology data relating to a processed semiconductor wafer;
- a computer system operatively coupled to said metrology tool, said computer system being capable of controlling stacking, directing, and storing metrology data bi-directionally, said computer system being capable of filtering metrology data;
- and
- a manufacturing model operatively coupled with said computer system, said manufacturing model being capable of modifying at least one control parameter capable of controlling a portion of an operation of a processing tool in response to said filtered metrology data.
An apparatus, comprising:
- a controller being capable of controlling stacking, directing, and storing metrology data relating to a processed semiconductor wafer in a bi-directional manner, said controller also being capable of filtering metrology data and modifying at least one control parameter capable of controlling a portion of an operation of a processing tool in response to said filtered metrology data.
A method, comprising:
- processing a semiconductor device;
- recording at least one manufacturing tag associated with said semiconductor device;
- acquiring metrology data relating to said processed semiconductor device;
- correlating said metrology data to at least one of a corresponding lot number and a corresponding time stamp of a production relating to said semiconductor device;
- determining an order for organizing said metrology data based upon said correlation of said metrology data;
- stacking said metrology data based upon said order for organizing said metrology data for creating stacked data;
- and
- modifying at least one control input parameter for controlling said processing based upon said stacked data.
Dependencies are inferred from the claim text.