Biased charge roller with embedded electrodes with post-nip breakdown to enable improved charge uniformity

An electroded biased charge roller, comprising:

• an insulating substrate;
• a semi-conductive layer over the insulating substrate;
• and
• a plurality of electrodes located in the semi-conductive layer, or between the insulating substrate and the semi-conductive layer, wherein the plurality of electrodes are deposited onto the insulating substrate, and substantially covered by the semi-conductive layer, wherein the electrodes longitudinally extend through the electroded biased charge roller to an end of the electroded biased charge roller, and wherein the electrodes are contacted substantially at the end of the electrically biased charge roller by stationary electrodes to provide the bias to the electrodes.

An electroded biased charge roller, comprising:

• an insulating substrate;
• a semi-conductive layer over the insulating substrate;
• and
• a plurality of electrodes located at least in the insulating substrate, in the semi-conductive layer, or between the insulating substrate and the semi-conductive layer, the semi-conductive layer exhibiting an approximate maximum relaxation time of a charge calculated by
• tRELAX<0.2×(WELECTRODE/VPROCESS)
• where WELECTRODE is a width of an embedded electrode and VPROCESS is a speed of a xerographic process.