Coaxial type impedance matching device and impedance detecting method for plasma generation
AssigneeTokyo Electron Limited
InventorsToshiaki Kitamura, Koichi Rokuyama, Shigeru Kasai, Takashi Ogino, Yuki Osada
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Abstract
A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
Claims4
A plasma generating method for generating a plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device, the plasma generating method comprising:
- controlling the high-frequency generating unit to generate and feed a high-frequency signal having a lower power than that generating plasma, to the treating chamber;
- measuring a reflectivity as a ratio of a reflected wave to a progressive wave between the high-frequency generating unit and the treating chamber in a state of feeding the high-frequency signal having the lower power than that generating plasma to the treating chamber;
- controlling the impedance matching device on the basis of at least the reflectivity measured to define a matching condition of the impedance matching device in which the reflectivity is not higher than a defined value, as a preset matching condition;
- controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy the preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
A plasma apparatus comprising:
- a high-frequency generating unit for generating a high-frequency signal;
- a treating chamber for generating a plasma therein when the high-frequency signal is fed thereto, the treating chamber for executing a predetermined treatment on a contained object with the plasma;
- an impedance matching device arranged between the high-frequency generating unit and the treating chamber, for matching an impedance therebetween;
- a measuring unit for measuring a reflectivity as a ratio of a reflected wave to a progressive wave between the high-frequency generating unit and the treating chamber;
- and
- a control unit for controlling the impedance matching device, wherein:
- the impedance matching device includes:
- a cylindrical external conductor;
- a column-shaped internal conductor arranged in the external conductor so that an axis of the external conductor and that of the internal conductor are identical;
- dielectrics being movable in a longitudinal direction of the internal conductor and disposed in clearance between the inner face of the external conductor and the outer face of the internal conductor;
- and
- a moving mechanism for moving the dielectrics;
- and
- the control unit controls the high-frequency generating unit to generate and feed the high-frequency signal having a lower power than that generating the plasma, to the treating chamber,
- controls the moving mechanism on the basis of at least the reflectivity measured in a state of feeding the high-frequency signal having the lower power than that generating plasma to the treating chamber,
- defines positions, at which the reflectivity is not higher than a defined value, of the dielectrics in the impedance matching device, as preset positions, and
- controls the moving mechanism, when the plasma is generated in the treating chamber, to move the dielectrics to the preset positions.
Dependencies are inferred from the claim text.