Manufacture method of display device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Yasuyuki Arai
Life of this patent
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Abstract
It is an object of the present invention to reduce the consumption of materials for manufacturing a display device, simplify the manufacturing process and the apparatus used for it, and lower the manufacturing costs. The present invention provides a technique to manufacture a display device, applying a means to form a pattern such as a contact hole formed in a semiconductor film, a wiring or an insulating film, or a mask pattern to form such a pattern by drawing directly, a means to remove a film, such as etching and ashing, and a film forming means to selectively form an insulating film, a semiconductor film and a metal film on a predetermined region.
Claims12
A method for manufacturing a display device comprising the steps of:
- forming a film which is at least an insulating film, a semiconductor film, and a metal film over a substrate by changing a gas into plasma and supplying the plasma from a plurality of discharging ports arranged in a uniaxial direction;
- forming a wiring pattern by drawing a composition including a conductive material over the substrate by discharging the composition including the conductive material from a plurality of discharge outlets for the composition are arranged in a uniaxial direction;
- forming a mask pattern by drawing a composition including a high molecular weight resin over the substrate by discharging the composition including the high molecular weight resin from a plurality of discharge outlets arranged in a uniaxial direction;
- etching for removing selectively the film formed over the substrate by changing a gas into plasma and supplying the plasma from a plurality of discharging ports arranged in a uniaxial direction;
- and
- removing the mask pattern made of the high molecular weight resin by changing a gas into plasma and supplying the plasma from a plurality of discharging ports arranged in a uniaxial direction.
A method for manufacturing a display device comprising the steps of:
- forming a pattern of a conductive film including a gate electrode, source and drain electrodes by discharging a composition from a plurality of discharge outlets arranged in a uniaxial direction;
- forming a non-single crystal semiconductor film and an inorganic insulating film by changing a gas into plasma and supplying the plasma from a plurality of discharging ports arranged in a uniaxial direction;
- and
- removing a part of the non-single crystal semiconductor film or the inorganic insulating film by changing a gas into plasma and supplying the plasma from a plurality of discharging ports arranged in a uniaxial direction.
A method for manufacturing a display device comprising:
- forming a film which is at least an insulating film, a semiconductor film, or a metal film over a substrate by changing a gas into plasma and supplying the plasma from a selected discharging port of a plurality of discharging ports arranged in a uniaxial direction;
- forming a wiring pattern by drawing a composition including a conductive material over the substrate by discharging the composition including the conductive material from a selected discharging outlet of a plurality of discharge outlets arranged in a uniaxial direction;
- forming a mask pattern by drawing a composition including a high molecular weight resin over the substrate by discharging the composition including the high molecular weight resin from a selected discharging outlet of a plurality of discharge outlets arranged in a uniaxial direction;
- etching for removing selectively the film formed over the substrate by changing a gas into plasma and supplying the plasma from a selected discharging port of a plurality of discharging ports arranged in a uniaxial direction;
- and
- removing the mask pattern made of the high molecular weight resin by changing a gas into plasma and supplying the plasma from a selected discharging port of a plurality of discharging ports arranged in a uniaxial direction.
A method for manufacturing a display device comprising the steps of:
- forming a pattern of a conductive film including a gate electrode, source and drain electrodes by discharging a composition from a selected discharging outlet of a plurality of discharge outlets arranged in a uniaxial direction;
- forming a non-single crystal semiconductor film and an inorganic insulating film by changing a gas into plasma and supplying the plasma from a selected discharging port of a plurality of discharging ports arranged in a uniaxial direction;
- and
- removing a part of the non-single crystal semiconductor film or the inorganic insulating film by changing a gas into plasma and supplying the plasma from a selected discharging port of a plurality of discharging ports arranged in a uniaxial direction.
Dependencies are inferred from the claim text.