Method for manufacturing MEMS structures
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMing-Chih Chang, H Shu Wu, Tsang-Mu Lai
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Abstract
A method for forming a free standing micro-structural member including providing a substrate; blanket depositing a first sacrificial resist layer over the substrate; exposing and developing the first sacrificial resist layer to form a first resist portion; subjecting the first resist portion to at least a hard bake process to form the first resist portion having a predetermined first smaller volume compared to a desired final resist portion volume; blanket depositing at least a second sacrificial resist layer followed by exposure, development and the at least a hard bake process to form the final resist portion volume; and, depositing at least one structural material layer over the final resist portion.
Claims20
A method for forming a free standing micro-structural member comprising the steps of:
- providing a substrate;
- forming a first sacrificial resist layer over the substrate;
- patterning the first sacrificial resist layer to form a first resist portion;
- subjecting the first resist portion to at least a first hard bake process to form the first resist portion having a first volume;
- forming at least a second sacrificial resist layer on a top surface of said first resist portion followed by patterning and conducting at least a second hard bake process to form a final resist portion having a final volume;
- depositing at least one structural material layer over the final resist portion;
- and
- removing said final resist portion.
A method for forming a free standing micro-structural member comprising the steps of:
- providing a substrate;
- forming a first sacrificial resist layer over the substrate;
- patterning the first sacrificial resist layer to form a first resist portion;
- subjecting the first resist portion to at least a first post treatment process to form the first resist portion having a first volume;
- forming at least a second sacrificial resist layer on a top surface of said first resist portion followed by patterning and conducting at least a second post treatment process to form a final resist portion having a final volume;
- depositing at least one structural material layer over the final resist portion;
- and
- removing said final resist portion.
A method for forming a free standing micro-structural member over a resist portion with improved dimensional tolerances comprising the steps of:
- providing a substrate;
- forming a first resist layer over the substrate;
- patterning the first resist layer to form a first resist portion having a predetermined first volume smaller compared to a predetermined final resist portion volume;
- subjecting the first resist portion to a first curing process comprising deep UV irradiation and thermal heating for a predetermined period to harden the first resist portion;
- forming at least a second resist layer having a predetermined thickness over the first resist portion followed by patterning and a second curing process to form the final resist portion volume;
- depositing at least one structural material layer over the final resist portion;
- and,
- removing the final resist portion according to at least one of an ashing and a wet stripping process to form a free standing structural member.
Dependencies are inferred from the claim text.