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US 7,169,251 B2Granted
Method of forming nanofluidic channels
AssigneeThe Regents of the University of Michigan
InventorsLingjie J Guo, Xing Cheng
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Abstract
A method of forming nanofluidic enclosed channels includes providing a first substrate having a layer of a first material disposed thereon. A plurality of nanoscale slots is formed along a second substrate using nanolithography, etching, or other disclosed techniques. The first substrate is then bonded to the second substrate such that the layer of the first material on the first substrate is adjacent the plurality of slots on the second substrate to define a plurality of enclosed nanofluidic channels therethrough.
Claims7
A method of forming enclosed nanofluidic channels, said method comprising:
- providing a first substrate having a layer of a first material thereon;
- providing a second substrate;
- forming a slot of nanoscale depth along said second substrate, said slot being formed by nanolithography and etching;
- and
- bonding said first substrate to said second substrate such that said layer of said first material on said first substrate is adjacent said slot on said second substrate to define an enclosed nanofluidic channel therethrough.
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Dependencies are inferred from the claim text.