Compliant hard template for UV imprinting
AssigneeMolecular Imprints, Inc.
InventorsMichael P. C. Watts, Ronald D. Voisin, Sidlgata V. Sreenivasan
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Abstract
A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.
Claims32
A lithography template comprising:
- a body;
- an imprinting layer comprising a plurality of protrusions and recessions, defining a pattern;
- and
- an elastomer positioned between said imprinting layer and said body, with said elastomer being configured to alter a portion of said pattern.
A lithography template comprising:
- a body;
- an imprinting layer comprising a plurality of protrusions and recessions, defining a pattern;
- and
- an elastomer, positioned between said imprinting layer and said body, with said elastomer being configured to alter a portion of said pattern in a first direction while minimizing dimensional variability in a second direction orthogonal to said first direction.
A lithography template comprising:
- a body;
- an imprinting layer comprising a plurality of protrusions and recessions, defining a pattern;
- and
- an elastomer positioned between said imprinting layer and said body, with said elastomer being configured to alter a portion of said pattern in response to a force while having suitable memory to return to an initial state in an absence of said force.
A lithography template, said template being substantially transparent to actinic radiation, said template comprising:
- a body;
- an imprinting layer comprising a plurality of protrusions and recessions, defining a pattern, with said imprinting layer being conformal with a non-planar surface of a substrate;
- and
- an elastomer positioned between said imprinting layer and said body, with said elastomer being configured to alter a portion of said pattern.
Dependencies are inferred from the claim text.