Exposure method, exposure apparatus, and method for producing device

An exposure method for exposing one of a first object and a second object with an exposure light beam passing through the other of the first object and the second object, the exposure method comprising:

• transporting the second object to a movable stage by the aid of a transport system;
• adjusting a position of the second object with respect to the transport system on a contour basis in an airtight chamber in which the transport system is located during the transport of the second object to the movable stage by the aid of the transport system, wherein an inner wall of a member which forms the airtight chamber is formed of or coated with a material involving little gas release;
• transporting the second object, of which position has been adjusted in the airtight chamber, to the movable stage through a space in which air-tightness is maintained;
• and
• exposing one of the first object and the second object transported to the movable stage with the exposure light beam passing through the other of the first object and the second object.

An exposure apparatus for exposing one of a first object and a second object with an exposure light beam passing through the other of the first object and the second object, the exposure apparatus comprising:

• a movable stage which adjusts a position of the second object;
• and
• a transport system which is arranged in an airtight transport chamber, an inner wall of which is formed of or coated with a material involving little gas release, and which transports the second object to the movable stage through a space in which air-tightness is maintained, wherein the transport system includes:
• a handling mechanism which has two or more degrees of freedom of displacement for incorporating the second object from the outside;
• a contour-detecting system which detects position information on a contour of the second object held by the handling mechanism;
• and
• an arm mechanism which has at least one degree of freedom of displacement for transporting the second object delivered from the handling mechanism in a direction toward the movable stage.

An exposure method for exposing a substrate with an exposure light beam by using an exposure apparatus provided with an airtight stage chamber in which a movable stage is provided, the exposure method comprising:

• importing the substrate into the airtight stage chamber, wherein an inner wall of a member which forms the airtight stage chamber is formed of or coated with a material involving little gas release;
• detecting, before the substrate is installed on the movable stage, a position of the substrate with respect to the movable stage by using a detecting system provided in the airtight stage chamber;
• adjusting the position of the substrate with respect to the movable stage in the airtight stage chamber based on a result of the detecting;
• installing, on the movable stage, the substrate which has been adjusted;
• moving the movable stage to adjust the position of the substrate with respect to an exposure position;
• and
• exposing the substrate with the exposure light beam.

An exposure method for exposing a substrate with an exposure light beam, the exposure method comprising:

• transporting the substrate to a movable stage by the aid of a transport system;
• adjusting a position of the substrate with respect to the transport system on a contour basis in an airtight chamber in which the transport system is located during the transport of the substrate to the movable stage by the aid of the transport system, wherein an inner wall of a member which forms the airtight chamber is formed of or coated with a material involving little gas release;
• transporting the substrate, of which position has been adjusted in the airtight chamber, to the movable stage through a space in which air-tightness is maintained;
• and
• exposing the substrate transported to the movable stage with the exposure light beam.

An exposure apparatus for exposing a substrate with an exposure light beam, the exposure apparatus comprising:

• a movable stage which adjusts a position of the substrate;
• and
• a transport system which is arranged in an airtight transport chamber, an inner wall of which is formed of or coated with a material involving little gas release, and which transports the substrate to the movable stage through a space in which air-tightness is maintained, wherein the transport system includes:
• a handling mechanism which has two or more degrees of freedom of displacement for incorporating the substrate from the outside;
• a contour-detecting system which detects position information on a contour of the substrate held by the handling mechanism;
• and
• an arm mechanism which has at least one degree of freedom of displacement for transporting the substrate delivered from the handling mechanism in a direction toward the movable stage.