Lithographic apparatus, device manufacturing method and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsRobrecht Emiel Maria Leonia De Weerdt, Johannes Adrianus Antonius Theodorus Dams
Life of this patent
Estimating the term…
Abstract
A lithographic projection apparatus includes a passive magnetic bearing configured to provide support between a first and second part of the lithographic apparatus and allow both parts to be displaced relative to each other in a direction perpendicular to the support direction. The passive magnetic bearing includes first and second magnetic assemblies. Each magnetic assembly includes at least one permanent magnet.
Claims16
A lithographic projection apparatus, comprising:
- a radiation system configured to provide a beam of radiation;
- a support configured to support a patterning device, the patterning device configured to pattern the projection beam according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a bearing configured to support a first part of the apparatus with respect to a second part of the apparatus in a first direction such that the first part is movable relative to the second part, wherein the bearing comprises a passive magnetic bearing, wherein, in use, the first part is supported by the second part in the first direction such that the first part is movable with respect to the second part in a second direction substantially perpendicular to the first direction and the second part includes a second magnetic assembly that is longer in the second direction than a first magnetic assembly of the first part.
A device manufacturing method for use with a lithographic projection apparatus, the method comprising:
- projecting a patterned beam of radiation onto a target portion of a substrate at least partially covered by a layer of radiation sensitive material;
- and
- supporting a first part of the apparatus with respect to a second part of the apparatus in a first direction such that the first part is movable relative to the second part, wherein the first part is supported with respect to the second part by a passive magnetic bearing, wherein the first part is supported by the second part in the first direction such that the first part is movable with respect to the second part in a second direction substantially perpendicular to the first direction and the second part includes a second magnetic assembly that is longer in the second direction than a first magnetic assembly of the first part.
Dependencies are inferred from the claim text.