Electron flood apparatus and ion implantation system

An electron flood apparatus for use in an ion implantation system for generating electrons, said apparatus comprising:

• a chamber of the electron flood apparatus having an opening for emitting said electrons, a supply port for supplying inert gas, a first part made of conductive material and a second part made of insulating material, and the chamber of the electron flood apparatus extending along a predefined closed curve;
• a magnetic field generator provided outside said first part to generate a magnetic field in a direction intersecting with a surface formed by said predefined closed curve;
• and
• a terminal electrically connected to said first part.

An ion implantation system comprising:

• an electron flood apparatus comprising:
• a chamber of the electron flood apparatus having an opening for emitting said electrons, a supply port for supplying inert gas, a first part made of conductive material and a second part made of insulating material, and the chamber of the electron flood apparatus extending along a predefined closed curve;
• a magnetic field generator provided outside said first part to generate a magnetic field in a direction intersecting with a surface formed by said predefined closed curve;
• and
• a terminal electrically connected to the chamber of the electron flood apparatus;
• and
• a tube through which an ion beam passes, wherein a side wall of said tube has an opening in communication with said opening of said chamber of said electron flood apparatus.