Method of effecting heating and cooling in reduced pressure atmosphere
AssigneeCanon Kabushiki Kaisha
InventorsShigeto Kamata, Akihiro Kimura
Life of this patent
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Abstract
A method of effecting high temperature vacuum heating and cooling suitable for conducting heat treatment to be performed on components used in a display apparatus. The heating/cooling method includes the steps of: heating a plate-like member placed in a reduced pressure atmosphere in a chamber by heating means opposed to the plate-like member; and cooling the plate-like member by a cooling plate which is opposed to the plate-like member, with the heating means therebetween, the cooling plate having a heat reflecting function. The cooling plate has an emissivity of not less than 0.50 but not more than 0.80 so as to minimize a sum of a requisite time for the heating step and a requisite time for the cooling step.
Claims14
A heating/cooling method comprising the steps of:
- heating a plate-like member placed in a reduced pressure atmosphere in a chamber by heating means opposed to the plate-like member;
- and
- cooling the plate-like member by a cooling plate which is opposed to the plate-like member, with the heating means disposed between the plate-like member and the cooling plate, the cooling plate having a heat reflecting function,
- wherein the cooling plate has an emissivity of not less than 0.50 but not more than 0.80.
A heating/cooling method comprising the steps of:
- heating a plate-like member placed in a reduced pressure atmosphere in a chamber by heating means opposed to the plate-like member;
- and
- cooling the plate-like member by a cooling plate which is opposed to the plate-like member, with the heating means disposed between the plate-like member and the cooling plate, the cooling plate having a heat reflecting function,
- wherein the cooling plate an emissivity that is a value which minimizes a sum of a requisite time for the heating step and a requisite time for the cooling step.
A method of manufacturing an image display apparatus having a container formed by using a substrate having two main surfaces opposite to each other, the method comprising the steps of:
- heating the substrate placed in a reduced pressure atmosphere in a chamber by heating means opposed to the substrate;
- and
- cooling the substrate by a cooling plate which is opposed to the substrate, with the heating means disposed between the substrate and the cooling plate, the cooling plate having a heat reflecting function,
- wherein the cooling plate has an emissivity of not less than 0.50 but not more than 0.80.
A method of manufacturing an image display apparatus having a container formed by using a substrate which has two main surfaces opposite to each other, the substrate having an accessory, whose heat capacity is different from that of the substrate, provided on a first surface of the two main surfaces thereof, the method comprising the steps of:
- heating the substrate placed in a reduced pressure atmosphere in a chamber by heating means opposed to the substrate;
- and
- cooling the substrate by a cooling plate which is opposed to the substrate, with the heating means disposed between the substrate and the cooling plate, the cooling plate having a heat reflecting function,
- wherein the heating means is opposed to a second surface of the two main surfaces of the substrate.
A method of manufacturing an image display apparatus having a container formed by using a substrate which has two main surfaces opposite to each other, the two main surfaces differing from each other in an in-plane distribution of emissivity, the method comprising the steps of:
- heating the substrate placed in a reduced pressure atmosphere in a chamber by heating means opposed to the substrate;
- and
- cooling the substrate by a cooling plate which is opposed to the substrate, with the heating means disposed between the substrate and the cooling plate, the cooling plate having a heat reflecting function,
- wherein the heating means is opposed to one of the two main surfaces of the substrate which has a smaller distribution of emissivity.
Dependencies are inferred from the claim text.