Capacitor including a dielectric layer having an inhomogeneous crystalline region and method of fabricating the same

A method of fabricating a capacitor, comprising:

• preparing a substrate;
• forming a lower conductive layer on the substrate;
• forming a dielectric layer on the lower conductive layer, the dielectric layer including a lower dielectric region contacting the lower conductive layer, an upper dielectric region formed as the uppermost region of the dielectric layer, and at least one middle dielectric region between the lower dielectric region and the upper dielectric region, at least one middle dielectric region having a less crystalline region than both of the lower dielectric region and the upper dielectric region;
• forming an upper conductive layer on the dielectric layer;
• and
• sequentially patterning the upper conductive layer, the dielectric layer, and the lower conductive layer to form an upper electrode, a patterned dielectric layer, and a lower electrode, respectively.