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US 7,125,640 B2Granted
Resist for photolithography having reactive groups for subsequent modification of the resist structures
AssigneeInfineon Technologies AG
InventorsJörg Rottstegge, Michael Sebald
Life of this patent
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Abstract
A photoresist contains a polymer that has no silicon-containing groups. Consequently, no expulsion of silicon-containing compounds in gaseous form occurs on exposure to short-wave radiation. The polymer is obtained by terpolymerization of a first comonomer having a group cleavable under acid catalysis, a second comonomer having an anchor group, and a monounsaturated hydrocarbon, in which individual carbon atoms of the carbon skeleton may also be replaced by oxygen, as a third comonomer. The polymer has a low glass transition temperature, and the photoresist therefore has a good layer quality on film formation and good structurability.
Claims8
A chemically amplified photoresist, comprising:
- a film-forming polymer obtained by copolymerizing:
- a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
- a second comonomer having an anchor group for binding amplification agents, and
- a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene, said alkene of said third comonomer of said film-forming polymer having a carbon atom replaced by an oxygen atom;
- a photo acid generator;
- and
- a solvent.
4 more elements
A chemically amplified photoresist, comprising:
- a film-forming polymer obtained by copolymerizing:
- a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
- a second comonomer having an anchor group for binding amplification agents, and
- a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene, said third comonomer being selected from the group consisting of a straight-chain hydrocarbon and a branched hydrocarbon, said straight-chain hydrocarbon and said branched hydrocarbon each including a respective non-terminal polymerizable carbon-carbon double bond;
- a photo acid generator;
- and
- a solvent.
4 more elements
A chemically amplified photoresist, comprising:
- a film-forming polymer obtained by copolymerizing;
- a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
- a second comonomer having an anchor group for binding amplification agents, and
- a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene, said third comonomer being an ether with an oxygen forming an ether bond and having a monounsaturated alkenyl radical bonded to said oxygen of said ether bond, and a substituent further bonded to said oxygen of said ether bond and selected from the group consisting of a straight-chain alkyl radical, branched alkyl radical, and alkoxyalkylene radical;
- a photo acid generator;
- and
- a solvent.
4 more elements
A chemically amplified photoresist, comprising:
- a film-forming polymer obtained by copolymerizing:
- a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
- a second comonomer having an anchor group for binding amplification agents, said anchor group of said second comonomer being a carboxylic anhydride group that is nucleophilically attackable, and
- a third comonomer having a non-vinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene;
- a photo acid generator;
- and
- a solvent.
4 more elements
A chemically amplified photoresist, comprising:
- a film-forming polymer obtained by copolymerizing:
- a first comonomer having a group cleavable under acid catalysis, said group being selected from the group consisting of a monocyclic alkyl group, a straight-chain alkyl group, and a branched alkyl group,
- a second comonomer having an anchor group for binding amplification agents, and
- a third comonomer having a nonvinylic carbon-carbon double bond capable of free radical polymerization and formed by a moiety selected from the group consisting of a straight-chain alkene and a branched alkene;
- said third comonomer being an ether with an oxygen forming an ether bond and having a monounsaturated alkenyl radical bonded to said oxygen of said ether bond, and a substituent further bonded to said oxygen of said ether bond and selected from the group consisting of a straight-chain alkyl radical and a branched alkyl radical;
- said ether having a structure of CH2═CR1—R2—O—R3;
- R1 being a substituent selected from the group consisting of a hydrogen atom, a methyl group, and a cyano group;
- R2 being a substituent selected from the group consisting of a single bond, a divalent linear alkylene group having from one to ten carbon atoms, and a divalent branched alkylene group having from one to ten carbon atoms, R2 not being said single bond when R1 is said hydrogen atom;
- and R3 being a monovalent alkyl group having from one to ten carbon atoms;
- a photo acid generator;
- and
- a solvent.
9 more elements
Dependencies are inferred from the claim text.