Method of manufacturing a piezoelectric thin film resonator
AssigneeTDK Corporation
InventorEiju Komuro
Life of this patent
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Abstract
A method of manufacturing a piezoelectric thin film resonator forms, after forming a piezoelectric film on a substrate so as to cover a lower electrode formed on the substrate, a resist layer so as to cover the piezoelectric film, forms a mask composed of the resist layer on the piezoelectric film by forming, in the resist layer, an exposure hole for exposing a formation part of an upper electrode on the piezoelectric film, forms an electrode material layer for forming the upper electrode on the piezoelectric film exposed via the exposure hole and on the mask, and then forms the upper electrode by removing the electrode material layer on the mask by removing the mask.
Claims18
A method of manufacturing a piezoelectric thin film resonator, the method comprising:
- forming a piezoelectric film on a substrate so as to cover a lower electrode formed on the substrate,
- forming a resist layer so as to cover the piezoelectric film,
- forming a mask composed of the resist layer on the piezoelectric film by forming, in the resist layer, an exposure hole for exposing a formation part of an upper electrode on the piezoelectric film,
- forming an electrode material layer for the upper electrode on the piezoelectric film exposed via the exposure hole and on the mask, and
- forming the upper electrode by removing the electrode material layer on the mask by removing the mask.
A method of manufacturing a piezoelectric thin film resonator, the method comprising:
- forming a resist layer so as to cover a substrate,
- forming a mask composed of the resist layer on the substrate by forming, in the resist layer, an exposure hole for exposing a formation part of a lower electrode on the substrate,
- forming an electrode material layer for the lower electrode on the substrate exposed via the exposure hole and on the mask,
- forming the lower electrode by removing the electrode material layer on the mask by removing the mask,
- forming a piezoelectric film on the substrate so as to cover the lower electrode, and
- forming an upper electrode on the piezoelectric film.
A method of manufacturing a piezoelectric thin film resonator, the method comprising:
- forming a resist layer so as to cover a substrate,
- forming a mask composed of the resist layer on the substrate by forming, in the resist layer, an exposure hole for exposing a formation part of a lower electrode on the substrate,
- forming an electrode material layer for the lower electrode on the substrate exposed via the exposure hole and on the mask,
- forming the lower electrode by removing the electrode material layer on the mask by removing the mask,
- forming a piezoelectric film on the substrate so as to cover the lower electrode and forming a resist layer so as to cover the piezoelectric film,
- forming a mask composed of the resist layer on the piezoelectric film by forming, in the resist layer on the piezoelectric film, an exposure hole for exposing a formation part of an upper electrode on the piezoelectric film,
- forming an electrode material layer for the upper electrode on the piezoelectric film exposed via the exposure hole and on the mask, and
- forming the upper electrode by removing the electrode material layer on the mask by removing the mask.
Dependencies are inferred from the claim text.