Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level

A performance evaluation method for a plasma processing apparatus which is disassembled before transfer, is transferred to a customer, and is reassembled at a customer site, the plasma processing apparatus comprising:

• a plurality of plasma processing chambers, each including an electrode to excite a plasma and a radiofrequency feeder, the electrode being connected to an output end of the radiofrequency feeder;
• a radiofrequency generator to supply a radiofrequency voltage to the electrode;
• and a matching circuit having an input terminal and an output terminal, the input terminal being connected to the radiofrequency generator and the output terminal being connected to an input end of the radiofrequency feeder so as to achieve impedance matching between the plasma processing chamber and the radiofrequency generator, the method comprising:
• determining that the plasma processing apparatus maintains a required level of performance when a variation f01r, defined by (f01max−f01min)/(f01max+f01min), between a maximum f01max and a minimum f01min of a first series resonant frequency f01 of each of the plurality of plasma processing chambers, after delivery of the apparatus, is less than an upper limit and when three times the first series resonant frequency f01 of each plasma processing chamber after the delivery is larger than a power frequency fe of a radiofrequency at the output terminal of the radiofrequency generator and that the plasma processing apparatus does not maintain the required level of performance one of when one of the variations f01r is not less than the upper limit and when three times the first series resonant frequency f01 of each plasma processing chamber is not larger than the power frequency e wherein each first series resonant frequency f01 is measured at the input end of the radiofrequency feeder of each plasma processing chamber.

A performance evaluation method for a plasma processing apparatus which is disassembled before transfer, is transferred to a customer, and is reassembled at a customer site, the plasma processing apparatus comprising:

• a plurality of plasma processing chambers, each including an electrode to excite a plasma and a radiofrequency feeder, the electrode being connected to an output end of the radiofrequency feeder;
• a radiofrequency generator to supply a radiofrequency voltage to the electrode of each of the plasma processing chambers;
• a radiofrequency supplier, an input end being connected to the radiofrequency generator;
• and a matching circuit having an input terminal and an output terminal, the input terminal being connected to the output end of the radiofrequency supplier and the output terminal being connected to an input end of the radiofrequency feeder so as to achieve impedance matching between the plasma processing chamber and the radiofrequency generator, the method comprising:
• determining that the plasma processing apparatus maintains a required level of performance when a variation f01r defined by (f01max−f01min)/(f01max+f01min), between a maximum f01max and a minimum f01min of a first series resonant frequency f01 of each of the plurality of plasma processing chambers, after delivery of the apparatus, is less than an upper limit and when three times the first series resonant frequency f01 of each plasma processing chamber after the delivery is larger than a power frequency fe of a radiofrequency at the output terminal of the radiofrequency generator and that the plasma processing apparatus does not maintain the required level of performance one of when one of the variations f01 r is not less than the upper limit and when three times the first series resonant frequency f01 of each plasma processing chamber is not larger than the power frequency fe,wherein the first series resonant frequency f01 is measured at the input end of the radiofrequency supplier of each plasma processing chamber.

A performance evaluation method for a plasma processing apparatus which is disassembled before transfer, is transferred to a customer, and is reassembled at a customer site, the plasma processing apparatus comprising:

• a plurality of plasma processing chambers, each including an electrode to excite a plasma and a radiofrequency feeder, the electrode being connected to an output end of the radiofrequency feeder;
• a radiofrequency generator to supply a radiofrequency voltage to the electrode of each of the plasma processing chambers;
• a radiofrequency supplier, an input end being connected to the radiofrequency generator;
• and a matching circuit having an input terminal and an output terminal, the input terminal being connected to the output end of the radiofrequency supplier and the output terminal being connected to an input end of the radiofrequency feeder so as to achieve impedance matching between the plasma processing chamber and the radiofrequency generator, the method comprising:
• determining that the plasma processing apparatus maintains a required level of performance when a variation f01r, defined by (f01max−f01min)/(f01max+f01min), between a maximum f01max and a minimum f01min of a first series resonant frequency f01 of each of the plurality of plasma processing chambers, after delivery of the apparatus, is less than an upper limit and when three times the first series resonant frequency f01 of each plasma processing chamber after the delivery is larger than a power frequency fe of a radiofrequency at the output terminal of the radiofrequency generator and that the plasma processing apparatus does not maintain the required level of performance one of when one of the variations f01r is not less than the upper limit and when three times the first series resonant frequency f01 of each plasma processing chamber is not larger than the power frequency fe wherein the first series resonant frequency f01 is measured at the input terminal of the matching circuit of each plasma processing chamber.

A performance evaluation method for a plasma processing apparatus which is disassembled before transfer, is transferred to a customer, and is reassembled at a customer site, the plasma processing apparatus comprising:

• a plurality of plasma processing chambers, each including an electrode to excite a plasma and a radiofrequency feeder, the electrode being connected to an output end of the radiofrequency feeder;
• a radiofrequency generator to supply a radiofrequency voltage to the electrode;
• and a matching circuit having an input terminal and an output terminal, the input terminal being connected to the radiofrequency generator and the output terminal being connected to an input end of the radiofrequency feeder so as to achieve impedance matching between the plasma processing chamber and the radiofrequency generator, the method comprising:
• determining that the plasma processing apparatus maintains a required level of performance when three times a first series resonant frequency f01 of each of the plasma processing chambers, after delivery of the apparatus, is larger than a power frequency fe of a radiofrequency at the output terminal of the radiofrequency generator and that the plasma processing apparatus does not maintain the required level of performance when three times the first series resonant frequency f01 of each of the plasma processing chambers is not larger than the power frequency fe, wherein the first series resonant frequency f01 of each of the plasma processing chambers is measured at the input end of the radiofrequency feeder of each of the plasma processing chambers.