Ion implantation apparatus and method
AssigneeKabushiki Kaisha Toshiba
InventorTakeshi Shibata
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Abstract
An ion implantation apparatus includes a laser beam irradiation unit which irradiates the surface of a target substrate with laser beam. The angle of an optical axis of the laser beam relative to the surface is adjustable. A reference line defining unit is adapted to define a virtual reference line which coincides with the optical axis of the laser beam when the angle takes a certain value. An ion irradiation unit provides an ion beam on a trajectory which coincides with the reference line.
Claims14
An ion implantation apparatus comprising:
- a laser beam irradiation unit irradiating a surface of a target substrate with laser beam, an angle of an optical axis of the laser beam relative to the surface being adjustable;
- a reference line defining unit adapted to define a virtual reference line coinciding with the optical axis of the laser beam when the angle takes a certain value;
- and
- an ion irradiation unit providing an ion beam on a trajectory coinciding with the reference line.
An ion implantation apparatus comprising:
- an ion irradiation unit irradiating a surface of a target substrate with an ion beam, an angle of a trajectory of the ion beam relative to the surface being adjustable;
- a reference line defining unit adapted to define a virtual reference line coinciding with the trajectory of the ion beam when the angle takes a certain value;
- and
- a substrate holding unit holding the target substrate and changing an inclination of the surface relative to the reference line to change the angle.
An ion implantation method comprising:
- defining a virtual reference line coinciding with an optical axis of laser beam directed onto a surface of a target substrate when an angle of the optical axis relative to the surface is a certain value;
- and
- irradiating the surface with an ion beam on a trajectory which coincides with the defined reference line.
An ion implantation method comprising:
- defining a virtual reference line, the reference line coinciding with a set trajectory of an ion beam emitted toward a virtual plane when an angle of the ion beam relative to the virtual plane becomes a certain value, a surface of a target substrate being to be positioned at the virtual plane;
- adjusting an angle of the surface relative to an optical axis of laser beam the trajectory of which coincides with the defined reference line;
- and
- irradiating the adjusted surface with the ion beam on the set trajectory.
Dependencies are inferred from the claim text.