Method to protect internal components of semiconductor processing equipment using layered superlattice materials
AssigneeAir Products and Chemicals, Inc.
InventorsBing Ji, Stephen Andrew Motika, Dingjun Wu, Eugene Joseph Karwacki, Jr., David Allen Roberts
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Abstract
This invention relates to apparatus and a method to protect the internal components of semiconductor processing equipment such as a plasma reactor or a reactive species generator against physical and/or chemical damages during etching and/or cleaning processes. Layered superlattice materials having three or more metal elements such as strontium bismuth tantalate (SBT) are used to form a protective barrier on the surfaces of the internal components of a reaction chamber.
Claims19
A chemical reaction chamber having an interior surface thereof coated with a corrosion resistant film of a layered superlattice material.
In a semiconductor process chamber having a corrosion resistant coating applied to an interior surface, the improvement which comprises, a corrosion resistant coating comprised of a layered strontium based superlattice material selected from the group consisting of strontium bismuth tantalite, strontium bismuth niobate, strontium bismuth tantalate niobate, BaBi2Ta2O9, PbBi2Ta2O9, and BaBi2Nb2O9.
In a process for imparting corrosion resistance to an interior surface of a semiconductor process chamber on exposure to a halogen containing gas;
- the improvement which comprises:
- applying a corrosion resistant coating comprised of a layered superlattice material on said interior surface prior to exposure to said halogen containing gas and said halogen containing gas selected from the group consisting of Cl2, HCl, BCl3, NF3, F2, and HF.
Dependencies are inferred from the claim text.