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US 7,118,847 B2Granted
Polymer and photoresist compositions
AssigneeShipley Company, L.L.C.
InventorsCharles R. Szmanda, George G. Barclay, Peter Trefonas, III, Wang Yueh
Life of this patent
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Abstract
Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.
Claims9
A polymer comprising as polymerized units
- (i) one or more spirocyclic olefin monomers of formulae I or II
- wherein Z=CH2, C(O), C(S), O or S;
- X and Y are independently chosen from CH2, C(O), C(S), O or NR2;
- and R2=(C1–C8)alkyl or substituted (C1–C8)alkyl;
- provided that at least one of X, Y and Z is selected from C(O) and C(S);
- and
- (ii) one or more cyclic olefin monomers having one or more substituent groups chosen from (C1–C12)halohydroxyalkyl;
- wherein the spirocyclic monomer is optionally substituted.
5 more elements
Dependencies are inferred from the claim text.