Semiconductor device and method of forming the same as well as a photo-mask used therein
AssigneeNEC Electronics Corporation
InventorMami Takeuchi
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Abstract
A method of forming a device pattern of a semiconductor device. The method includes the steps of carrying out an over-exposure to a resist film using a mask which has transmission regions which are positioned about a circumference of each of intended patterns of a resist film. Then carrying out a development of the resist film to form a resist pattern having the intended patterns. And then forming a device pattern of a semiconductor device by use of the resist pattern.
Claims3
A mask to be used for an exposure in a lithography process, said mask having inverted patterns comprising transmission regions which are positioned on a circumference of each of intended patterns of a resist film.
Dependencies are inferred from the claim text.