Back to results
US 7,118,832 B2Granted
Reflective mask with high inspection contrast
AssigneeIntel Corporation
InventorPei-Yang Yan
Life of this patent
Estimating the term…
Abstract
A reflective mask may include an anti-reflective (AR) coating on an absorber layer to improve inspection contrast in an inspection system using deep ultraviolet (DUV) light. A silicon nitride (Si3N4) AR coating may be used on a chromium (Cr) or tantalum nitride (TaN) absorber layer.
Claims18
An apparatus comprising:
- a reflective mask having an inspection contrast of greater than about 30% for ultraviolet inspection light, the reflective mask comprising
- a reflector;
- and
- a plurality of absorber regions masking portions of the reflector, the absorber regions each including:
- absorber material comprising tantalum nitride;
- buffer material positioned between a first side of the absorber material and the reflector;
- and
- an anti-reflective coating comprising silicon nitride and positioned to cover a second side of the absorber material opposite the first side.
5 more elements
A method comprising:
- reflecting ultraviolet radiation off of a reflective mask having a first pattern, the reflective mask comprising a reflector and a plurality of absorber regions masking portions of the reflector, each of the plurality of absorber regions including a buffer layer, an absorber layer comprising tantalum nitride and covering the buffer layer, and an anti-reflective coating comprising silicon nitride and covering the absorber layer;
- and
- capturing a reflected pattern corresponding to the first pattern, the reflected pattern having an inspection contrast of greater than about 30%.
A reflective mask comprising:
- a pattern of absorber regions masking portions of a reflector, wherein each of the absorber regions comprises:
- protective material covering the reflector;
- absorber material comprising tantalum nitride and covering the protective material;
- and
- anti-reflective material comprising silicon nitride and covering the absorber material.
2 more elements
A method comprising:
- forming a reflector on a substrate;
- forming a buffer layer to cover the reflector;
- forming an absorber layer to cover the buffer layer, the absorber layer comprising tantalum nitride;
- and
- forming an anti-reflective layer comprising silicon nitride to cover the absorber layer.
2 more elements
Dependencies are inferred from the claim text.