Polishing pad with window and method of fabricating a window in a polishing pad
AssigneeApplied Materials, Inc.
InventorsManoocher Birang, Allan Gleason, William L. Guthrie
Life of this patent
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Abstract
The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.
Claims17
A polishing pad assembly for a chemical mechanical polishing apparatus, comprising:
- a polishing pad having a polishing surface;
- an aperture formed through the polishing pad;
- and
- a solid, substantially transparent window spanning the aperture and attached to the polishing pad, wherein a portion of the polishing pad extends laterally over the window.
A method of assembling a polishing pad assembly, compnsing:
- providing a polishing pad having a polishing surface and an aperture formed through the polishing pad;
- and
- bringing a solid, substantially transparent window into contact with the polishing pad such that the window spans the aperture and a portion of the polishing pad extends laterally over the window.
Dependencies are inferred from the claim text.