Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

A computer program product, comprising executable code transportable by at least one machine readable medium, wherein execution of the code by at least one programmable computer causes the at least one programmable computer to perform a sequence of steps for optimizing a process for use with a plurality of lithography systems, said sequence of steps comprising:

• (a) determining a calibrated resist model for a given process and a target pattern utilizing a first lithography system;
• (b) selecting a second lithography system to be utilized to image said target pattern utilizing said given process, said second lithography system capable of being configured with one of a plurality of diffractive optical elements, each of said plurality of diffractive optical elements having corresponding variable parameters for optimizing performance of the given diffractive optical element;
• (c) selecting one of said plurality of diffractive optical elements and simulating the imaging performance of said second lithography system utilizing said selected one of said plurality of diffractive optical elements, said calibrated resist model and said target pattern;
• and
• (d) optimizing the imaging performance of said selected one of said plurality of diffractive optical elements by executing a genetic algorithm which identifies the values of the parameters of the selected one of the plurality of diffractive optical elements that optimizes the imaging of the target pattern.