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US 7,116,398 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJohan Christiaan Gerard Hoefnagels, Peter Spit
Life of this patent
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Abstract
A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
Claims17
A device manufacturing method, comprising:
- (a) inspecting for a fault found in a pattern formed on a first substrate, which was patterned according to a first pattern;
- (b) creating or modifying a second pattern that compensates for the fault in the pattern formed on the first substrate in response to the inspected pattern;
- (c) patterning a second substrate using the second pattern;
- and
- (d) coupling the second substrate to the first substrate.
2 more elements
A device manufacturing method, comprising:
- (a) inspecting respective patterns formed on a plurality of first substrates that are patterned according to a first pattern to determine an average pattern;
- (b) generating or modifying a second pattern in response to the average pattern generated by the inspection;
- (c) patterning respective beams of radiation based on the second pattern;
- (d) projecting the respective patterned beams of radiation onto corresponding ones of a plurality of second substrates;
- and
- (e) coupling each of the plurality of first substrates to a respective one of the plurality of second substrates.
3 more elements
A lithographic apparatus, comprising:
- an inspection system that inspects for a fault in a pattern formed on a first substrate patterned according to a first pattern;
- a controller that creates or modifies a second pattern to compensate for the fault, in response to data generated by the inspection system;
- an array of individually controllable elements that pattern a beam according to the second pattern;
- a projection system that projects the patterned beam onto a target portion of a second substrate;
- and
- an assembly system that couples together the first and second substrates.
3 more elements
Dependencies are inferred from the claim text.