Back to results
US 7,116,397 B2Granted
Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorTomoharu Hase
Life of this patent
Estimating the term…
Abstract
An exposure apparatus includes an optical system having a first optical element, for directing light from a light source to a member to be exposed. The first optical element serves to separate first and second spaces inside the optical system, and the first optical element has a first notch formed at an end portion outside an effective light flux of light from the light source.
Claims3
An exposure apparatus for exposing a substrate to light through a reticle, said apparatus comprising:
- a barrel configured to house therein a lens that directs the light;
- a first lens unit, said first lens unit separating a first space and a second space in said barrel from each other, said first lens unit having a first aperture and a second aperture;
- a second lens unit, said second lens unit separating the second space and a third space in said barrel from each other, said second lens unit having a third aperture and a fourth aperture;
- a first piping configured to supply a gas to said first space;
- and
- a second piping configured to discharge a gas out of said third space,
- wherein said first to fourth apertures are disposed in an order of first aperture, third aperture, second aperture, and fourth aperture, with respect to a rotational direction about an optical axis of said first and second lens units.
4 more elements
Dependencies are inferred from the claim text.