Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
AssigneesASML Netherlands B.V., Carl Zeiss SMT GmbH
InventorsLevinus Pieter Bakker, Ralph Kurt, Bastiaan Matthias Mertens, Markus Weiss, Johann Trenkler, Wolfgang Singer
Life of this patent
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Abstract
A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.
Claims31
A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus, the cleaning system comprising:
- an electric field generator that generates an electric field to provide cleaning particles near said surface of said component;
- and
- a contamination adjuster, communicatively connected to the electric field generator, that adjusts at least one property of the electric field in relation to at least one property of the contamination to be removed.
A method for removing contamination from at least a part of a surface of a component of a lithographic projection apparatus, the method comprising:
- generating an electric field in at least a part of the lithographic projection apparatus;
- providing cleaning particles near said contamination with said electric field;
- adjusting at least one property of the electric field in relation to at least one property of the contamination to be removed;
- and
- removing at least a part of said contamination via interaction of said cleaning particles with said contamination.
A device manufacturing method comprising:
- removing contamination from at least a part of a surface of a component of a lithographic projection apparatus, wherein said removing contamination comprises
- generating an electric field in at least a part of the lithographic projection apparatus,
- providing cleaning particles near said contamination with said electric field, and
- removing at least a part of said contamination via interaction of said cleaning particles with said contamination;
- providing a beam of radiation;
- using a patterning structure to endow the beam of radiation with a pattern in its cross-section;
- and
- projecting the patterned beam of radiation onto a target portion of a substrate.
A lithographic projection apparatus comprising:
- a radiation system that provides a beam of radiation;
- a support structure that supports a patterning structure, the patterning structure configured to pattern the beam of radiation according to a desired pattern;
- a substrate support that supports a substrate;
- a projection system that projects the patterned beam onto a target portion of the substrate;
- and
- an electric field generator that provides cleaning particles to a surface of a component of the apparatus to remove contamination from said surface.
A device manufacturing method comprising:
- removing contamination from at least a part of a surface of a component of a lithographic projection apparatus, wherein said removing contamination comprises
- generating an electric field in at least a part of the lithographic projection apparatus,
- providing cleaning particles near said contamination with said electric field,
- adjusting at least one property of the electric field in relation to at least one property of the contamination to be removed, and
- removing at least a part of said contamination via interaction of said cleaning particles with said contamination;
- providing a beam of radiation;
- using a patterning structure to endow the beam of radiation with a pattern in its cross-section;
- and
- projecting the patterned beam of radiation onto a target portion of a substrate.
A lithographic projection apparatus comprising:
- a radiation system that provides a beam of radiation;
- a support structure that supports a patterning structure, the patterning structure configured to pattern the beam of radiation according to a desired pattern;
- a substrate support that supports a substrate;
- a projection system that projects the patterned beam onto a target portion of the substrate;
- an electric field generator that provides cleaning particles to a surface of a component of the apparatus to remove contamination from said surface;
- and
- a contamination adjuster, communicatively connected to the electric field generator, that adjusts at least one property of the electric field in relation to at least one property of the contamination to be removed.
Dependencies are inferred from the claim text.