Site stepping for electron beam micro analysis

A method of measuring properties of a sample using an electron beam, the method comprising the steps of:

• define coordinates of a measurement site on the sample,
• define a diameter of the electron beam,
• determine multiple measurement locations within the measurement site using the coordinates of the measurement site and the diameter of the electron beam, which measurement locations are selected such that the electron beam when directed at the multiple measurement locations substantially covers the measurement site, wherein the multiple measurement locations are determined so as to provide a desired balance between increasing coverage of the measurement site with the electron beam and reducing trending effects of the electron beam within the measurement site, and no portion of the electron beam when directed at the multiple measurement locations extends outside of the measurement site, and
• direct the electron beam to the measurement locations and measure properties of the sample at each of the measurement locations based upon x-ray emmission from the sample induced by the electron beam.

An apparatus for measuring properties of a sample, the apparatus comprising:

• an electron beam adapted to function as a measurement probe,
• an input adapted to receive coordinates of a measurement site on the sample, and a diameter of the electron beam,
• means to direct the electron beam toward the sample,
• means to take measurements from sample based upon x-ray emission from the sample induced by the electron beam,
• means for moving at least one of the electron beam and the sample relative to the other, and
• a controller having programming modules to,
• determine multiple measurement locations within the measurement site using the coordinates of the measurement site and the diameter of the electron beam, which measurement locations are selected such that the electron beam when directed at the multiple measurement locations substantially covers the measurement site,
• direct the electron beam to the measurement locations, and
• measure properties of the sample at each of the measurement locations using the measurement means.