Micro-lens configuration for small lens focusing in digital imaging devices
AssigneeMicron Technology, Inc.
InventorsTongbi Jiang, Michael Connell, Jin Li
Life of this patent
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Abstract
An improved image sensor wherein a first micro-lens array comprised of one or more micro-lenses is positioned over a cavity such that incoming light is focused on the photo sensors of the image sensor. The first micro-lens array may collimate and focus incoming light onto the photo sensors of the image sensor, or may collimate incoming light and direct it to a second micro-lens array which then focuses the light onto the photo sensors. A method of fabricating the improved image sensor is also provided wherein the cavity and first micro-lens array are formed by use of a sacrificial material.
Claims25
A method of fabricating an image sensor, the method comprising:
- providing a substrate comprising a plurality of photosensitive regions having photo sensors, and an upper substrate layer;
- providing a color filter array on top of the upper substrate layer;
- applying a sacrificial material to the upper substrate layer;
- forming support molds in the sacrificial material;
- forming lens molds in the sacrificial material;
- forming supports by filling the support molds with a support material;
- forming a first micro-lens array having first micro-lenses by filling the lens molds with a first micro-lens material;
- and
- removing the sacrificial material.
A method of fabricating an image sensor, the method comprising:
- providing a substrate comprising a plurality of photosensitive regions having photo sensors, and an upper substrate layer;
- applying a sacrificial material above the upper substrate layer;
- forming lens molds in the sacrificial material;
- forming a micro-lens array having micro-lenses by filling the lens molds with a micro-lens material;
- and
- removing the sacrificial material.
A method of fabricating an image sensor, the method comprising:
- providing a substrate comprising a plurality of photosensitive regions having photo sensors, and an upper substrate layer;
- providing a color filter array on top of the upper substrate layer;
- applying a sacrificial material to the upper substrate layer;
- forming support molds in the sacrificial material;
- forming lens molds in the sacrificial material;
- forming supports by filling the support molds with a support material;
- forming a first micro-lens array having first micro-lenses by filling the lens molds with a first micro-lens material;
- removing the sacrificial material;
- forming vacuum channels through the first micro-lens array, wherein the distal ends of the vacuum channels are adjacent the sacrificial material;
- and
- using the vacuum channels to remove residual particles that remain in the image sensor after the step of removing the sacrificial material.
A method of fabricating an image sensor, the method comprising:
- providing a substrate comprising a plurality of photosensitive regions having photo sensors, and an upper substrate layer;
- applying a sacrificial material above the upper substrate layer;
- forming lens molds in the sacrificial material;
- forming a micro-lens array having micro-lenses by filling the lens molds with a micro-lens material;
- removing the sacrificial material;
- forming support molds in the sacrificial material;
- forming supports by filling the support molds with a support material;
- forming vacuum channels through the micro-lens array, wherein the distal ends of the vacuum channels are adjacent the sacrificial material;
- and
- using the vacuum channels to remove residual particles that remain in the image sensor after the step of removing the sacrificial material.
Dependencies are inferred from the claim text.