Method of manufacturing semiconductor device

A method of manufacturing a semiconductor device having a super junction structure with a first conductivity type semiconductor layer on which a trench groove whose aspect ratio is R is provided and a second conductivity type semiconductor layer which is buried in the trench groove, the method of manufacturing the semiconductor device comprising:

• forming a trench groove having an aspect ratio of R/N, N being a natural number greater than 1, in a first conductivity type semiconductor layer;
• epitaxially growing a second conductivity type semiconductor layer so as to bury the trench groove;
• removing the second conductivity type semiconductor layer until a surface of the first conductivity type semiconductor layer is exposed;
• epitaxially growing the first conductivity type semiconductor layer on the first conductivity type semiconductor layer and the second conductivity type semiconductor layer such that the thickness of the first conductivity type semiconductor layer increases by a length which is substantially the same as a depth of the trench groove formed by said first process;
• selectively removing the first conductivity type semiconductor layer such that the second conductivity type semiconductor layer which is buried in the trench groove formed by said first process is exposed;
• and
• repeating said epitaxially growing the second conductivity type semiconductor layer through selectively removing the first conductivity type semiconductor layer N−1 times.