Lapping system with mutually stabilized lapping carriers

A lapping system for fixturing a magnetic head wafer workpiece for lapping, comprising:

• a lapping fixture having a carrier portion adapted to carry a workpiece and a stabilizer portion extending from said carrier portion;
• an anchor attached to a free end of said stabilizer portion for anchoring said lapping fixture;
• a pad on said anchor for supporting said anchor on a lapping surface that laps said workpiece;
• and
• said lapping fixture being configured so that said stabilizer portion does not restrict rotation of said workpiece about a longitudinal axis of said stabilizer portion.

A lapping system for fixturing a magnetic head wafer workpiece for lapping, comprising:

• a first lapping carrier adapted to carry a first workpiece;
• a second lapping carrier adapted to carry a second workpiece;
• a stabilizer assembly interconnecting said first and second lapping carriers in a mutually stabilizing arrangement that stabilizes said first and second workpieces against rotation;
• said first and second lapping carriers being adapted for actuation by independent downward lapping forces;
• said stabilizer assembly comprising first and second stabilizer arms extending between said first lapping carrier and said second lapping carrier;
• said first stabilizer arm being cantilevered from said first lapping carrier and said second stabilizer arm being cantilevered from said second lapping carrier;
• a free end of said first stabilizer arm being pivotally mounted to said second lapping carrier and a free end of said second stabilizer arm being pivotally mounted to said first lapping carrier;
• said pivotal mounting being provided by protrusions on said free ends of said first and second stabilizer arms engaging corresponding depressions formed in said first and second lapping carriers;
• said pivotal mounting being further provided by retainers urging said protrusions into engagement with said depressions;
• said retainers comprising biasing members;
• said depressions being situated in recesses formed in said first and second lapping carriers;
• said depressions being situated above and in line with one of said workpieces;
• and
• a reference fixture adapted to maneuver said lapping system horizontally over a lapping surface.