Pattern formation method and substrate manufacturing apparatus
AssigneeSeiko Epson Corporation
InventorsHiroshi Kiguchi, Hitoshi Fukushima, Satoshi Nebashi, Tatsuya Shimoda
Life of this patent
Estimating the term…
Loading patent…
AssigneeSeiko Epson Corporation
InventorsHiroshi Kiguchi, Hitoshi Fukushima, Satoshi Nebashi, Tatsuya Shimoda
Estimating the term…
A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.
A pattern formation method for discharging a prescribed fluid onto a substrate from an ink-jet head forming an arbitrary pattern, said pattern formation method comprising:
Dependencies are inferred from the claim text.