Method for large-area patterning dissolved polymers by making use of an active stamp
AssigneePalo Alto Research Center Incorporated
InventorsAlberto Salleo, William S. Wong
Life of this patent
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Abstract
A method of patterning soluble materials on a substrate is described. In the method, a stamp is applied to a liquid carrier solution. The raised areas of the stamp removes mainly a liquid carrier leaving behind a precipitate while the non-raised areas of the stamp lifts both the liquid carrier and the precipitate from the substrate. The result is a precipitate pattern residue that matches the raised area of the stamp. One use of the method is for patterning large areas of polymers used in large area electronics such as displays and sensors.
Claims28
A method of forming an patterned surface feature comprising the operations of:
- depositing a liquid carrier solution including a liquid carrier carrying a precipitate on a substrate;
- bringing a relief pattern formed on a stamp into contact with the liquid carrier solution such that raised portions of the relief pattern absorbs the liquid carrier leaving a precipitate layer between the raised portions of the relief pattern and the substrate, the non-raised portions of the relief pattern drawing the liquid carrier solution including both the liquid carrier and the precipitate away from the substrate surface;
- and,
- removing the stamp such that a pattern remains on the substrate, the precipitate layer patterned to match the raised portions of the relief pattern.
Dependencies are inferred from the claim text.