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US 7,112,289 B2Granted
Etchants containing filterable surfactant
AssigneeGeneral Chemical Performance Products LLC
InventorsErik Mori, Brian Hong, James Craig
Life of this patent
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Abstract
An improved etching and cleaning composition for semiconductor devices is provided in which the etch solution incorporates a novel surfactant comprising a combination of a linear perfluorocarboxylic acid, a cyclic amine and an aliphatic alcohol.
Claims11
An aqueous etching composition for etching semiconductor devices and materials comprising at least one etchant selected from the group consisting of:
- (a) ammonium fluoride and hydrofluoric acid, (b) phosphoric acid mixtures with (a), and (c) mixtures of (b) with one or more acids selected from sulfuric acid, acetic acid, nitric acid, fluoroboric acid;
- and containing at least 10 ppm, based on the weight of an aqueous etching composition of a surfactant comprising:
- (i) cyclic alkylamine of formula
- CxH2x+1N or (CH2)x−1CH NH2
- wherein x is an integer of 5 to 8;
- (ii) a linear perfluorocarboxylic acid of the formula
- CnF2n−1O2H or Cn−1F2n−1COOH
- wherein n is an integer of 4 to 11 and yields a perfluoroamide of the formula
- Cn−1F2n−1CO NHCH(CH2)x−1
- wherein n=4 to 11 and x=5 to 8
- when reacted with the cyclic alkylamine and
- (iii) an aliphatic alcohol of the formula
- CnH2n+2O, or CnH2n+1OH,
- wherein n is an integer of 1 to 5.
11 more elements
Dependencies are inferred from the claim text.