Apparatus and method for in-situ measuring of vibrational energy in a process bath of a vibrational cleaning system
AssigneeAgere Systems Inc.
InventorsDaniel Charles Kerr, Alan R. Olds, Bradley Curtis Deselms, Dennis P. Biondi, William A. Russell
Life of this patent
Estimating the term…
Abstract
Apparatus and method are provided for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system. The apparatus may be made up of a test wafer comprising an array of pressure sensing elements disposed thereon for monitoring power level variation of a time-varying pressure wave. The time-varying pressure wave is indicative of vibrational energy that would be applied to a wafer in the process bath in the position of the test wafer.
Claims20
Apparatus for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system, wherein said apparatus comprises a test wafer comprising:
- an array of pressure sensing elements disposed thereon for monitoring power level variation of a time-varying pressure wave, said time-varying pressure wave indicative of vibrational energy that would be applied to a wafer in the process bath in the position of the test wafer;
- and
- a transmitter for wirelessly communicating the electrical signal from each pressure-sensing element.
Apparatus for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system, wherein said apparatus comprises a test wafer comprising:
- an array of pressure sensing elements disposed thereon for monitoring power level variation of a time-varying pressure wave, said time-varying pressure wave indicative of vibrational energy that would be applied to a wafer in the process bath in the position of the test wafer;
- a memory device for storing over a period of time the electrical signal from each pressure-sensing element.
A method for in-situ measuring of vibrational energy in a process bath of a vibration system used for cleansing one or more semiconductor workpieces, said method comprising:
- providing a test wafer with an array of pressure sensing elements;
- and monitoring with the array of pressure sensing elements power level variation of a time-varying pressure wave in said process bath;
- and
- wirelessly transmitting an electrical signal from each pressure-sensing element.
A method comprising:
- providing a test wafer with an array of pressure sensing elements;
- monitoring, with the test wafer, a pressure wave in a process bath used for cleaning a semiconductor workpiece, the pressure wave being formed by a plurality of transducers;
- processing an output signal from each of the pressure sensing elements to generate a map indicative of vibrational power readings corresponding to a plurality of locations on the test wafer;
- and
- matching individual ones of the plurality of transducers to a generator that powers the transducers.
A method for in-situ measuring of vibrational energy in a process bath of a vibrational system used for cleansing one or more semiconductor workpieces, said method comprising:
- providing a test wafer with an array of pressure sensing elements;
- monitoring a pressure wave in said process bath using the test wafer;
- processing an output signal from ones of the pressure sensing elements to generate a map indicative of vibrational power readings corresponding to a plurality of locations on the test wafer;
- and
- using the generated map indicative of vibrational power readings for determining effects of different process tools in the process bath.
Dependencies are inferred from the claim text.