Photosensitive bottom anti-reflective coatings
AssigneeBrewer Science Inc.
InventorDouglas J. Guerrero
Life of this patent
Estimating the term…
Abstract
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. Preferred polymers include polycarbonates, polysulfonyl esters, polycarbonate sulfones, and mixtures thereof. The compositions can be applied to a silicon wafer or other substrate to form a cured or hardened layer which is initially insoluble in typical photoresist developing solutions. Upon exposure to light, the cured or hardened layers become soluble in photoresist developing solutions so that the layer can be selectively removed along with the developed photoresist layer, thus eliminating the need for a separate removal step.
Claims59
A polymer comprising recurring monomers having a formula selected from the group consisting of:
- where:
- each of R1 and R2 is individually selected from the group consisting of functional moieties of aliphatic diols, heterocyclic diols, bisphenol A, bisphenol P,
- at least one of R1 and R2 is selected from the group consisting of functional moieties of the bisphenol A and bisphenol P;
- and
- when one of R1 or R2 is a moiety of bisphenol A, the other of R1 and R2 is a group other than
- where:
- X1 is selected from the group consisting of functional moieties of diols and dioximes;
- X2 is selected from the group consisting of substituted and unsubstituted aryls and alkyls;
- at least one of X1 and X2 includes an aromatic group;
- and
- where:
- each of R3 and R4 is individually selected from the group consisting of substituted and unsubstituted aryls and alkyls;
- at least one of R3 and R4 includes an —SO2 group;
- and
- at least one of R3 and R4 includes an aromatic group.
An anti-reflective composition comprising a polymer dispersed or dissolved in a solvent system, the improvement being that said polymer is selected from the group consisting of polysulfonyl esters, polycarbonate sulfones, polycarbonates comprising recurring monomers having a formula selected from the group consisting of:
- where:
- each of R1 and R2 is individually selected from the group consisting of functional moieties of diols;
- at least one of R1 and R2 is selected from the group consisting of functional moieties of the bisphenols;
- and
- when one of R1 or R2 is a moiety of bisphenol A, the other of R1 and R2 is a group other than
- and mixtures of the foregoing.
A method of using a composition in photolithographic processes, said method comprising the step of applying a quantity of a composition to a substrate to form a layer thereon, said composition comprising:
- a solvent system;
- and
- a polymer dispersed or dissolved in said solvent system, wherein said polymer is selected from the group consisting of polysulfonyl esters, polycarbonate sulfones, polycarbonates comprising recurring monomers having a formula selected from the group consisting of:
- where:
- each of R1 and R2 is individually selected from the group consisting of functional moieties of diols;
- at least one of R1 and R2 is selected from the group consisting of functional moieties of the bisphenols;
- and
- when one of R1 or R2 is a moiety of bisphenol A, the other of R1 and R2 is a group other than
- and mixtures of the foregoing.
A precursor structure formed during photolithographic processes, said structure comprising:
- a substrate having a surface;
- an anti-reflective layer on said substrate surface, said layer being formed from a composition comprising:
- a solvent system;
- and
- a polymer dispersed or dissolved in said solvent system, wherein said polymer is selected from the group consisting of polysulfonyl esters, polycarbonate sulfones, polycarbonates comprising recurring monomers having a formula selected from the group consisting of:
- where:
- each of R1 and R2 is individually selected from the group consisting of functional moieties of diols;
- at least one of R1 and R2 is selected from the group consisting of functional moieties of the bisphenols;
- and
- when one of R1 or R2 is a moiety of bisphenol A, the other of R1 and R2 is a group other than
- and mixtures of the foregoing.
A polymer comprising recurring monomers having the formula
- where:
- one of R1 and R2 is selected from the group consisting of functional moieties of bisphenol Z;
- and
- the other of R1 and R2 has the formula
- where R5 is an alkyl group and Ar is an aryl group.
An anti-reflective composition comprising a polymer dispersed or dissolved in a solvent system, the improvement being that said polymer is selected from the group consisting of polycarbonates, polysulfonyl esters, polycarbonate sulfones, and mixtures thereof, said polymer having an average molecular weight of from about 2,000–20,000 Daltons.
A method of using a composition in photolithographic processes, said method comprising the step of applying a quantity of a composition to a substrate to form a layer thereon, said composition comprising:
- a solvent system;
- and
- a polymer dispersed or dissolved in said solvent system, wherein said polymer is selected from the group consisting of polycarbonates, polysulfonyl esters, polycarbonate sulfones, and mixtures thereof, said polymer having an average molecular weight of from about 2,000–20,000 Daltons.
A precursor structure formed during photolithographic processes, said structure comprising:
- a substrate having a surface;
- an anti-reflective layer on said substrate surface, said layer being formed from a composition comprising:
- a solvent system;
- and
- a polymer dispersed or dissolved in said solvent system, wherein said polymer is selected from the group consisting of polycarbonates, polysulfonyl esters, polycarbonate sulfones, and mixtures thereof, said polymer having an average molecular weight of from about 2,000–20,000 Daltons.
Dependencies are inferred from the claim text.