Method of making LCD with asperities in insulation layer under reflective electrode

A method of making a reflective liquid crystal display, the method comprising:

• providing a substrate;
• applying a photosensitive resin on the substrate;
• using a single photomask to form both a) asperities in a first region of the photosensitive resin which do not extend all the way through the photosensitive resin, and b) contact holes in a second region of the photosensitive resin, said contact holes extending all the way through the photosensitive resin;
• providing said photomask with light transmitting portions, light intercepting portions, and semi-light transmitting portions, so that different amounts of light exposure are utilized using said photomask in order to form at least one of said asperities and said contact holes;
• developing the exposed photosensitive resin;
• heat treating the developed photosensitive resin;
• and
• forming a reflective electrode on the heat treated photosensitive resin so that said reflective electrode is in electrical communication with a switching element through at least one of said contact holes.

A method of making a reflective liquid crystal display, the method comprising:

• applying a photosensitive resin to a substrate;
• forming asperities which do not extend all the way through the resin in a first region of the photosensitive resin by using a first photomask and exposing at least part of the first region using said first photomask;
• forming contact holes in a second region of the photosensitive resin using a second photomask different than the first photomask, and exposing at least part of the second region using said second photomask;
• developing the exposed photosensitive resin;
• heat treating the developed photosensitive resin;
• forming a reflective electrode on the heat treated photosensitive resin over asperities so that said reflective electrode is in communication with at least one switching element through at least one of the contact holes;
• and
• wherein exposure amounts using the first and second photomasks are the same.

A method of manufacturing a liquid crystal display apparatus having, on one of a pair of substrates disposed so as to be opposed with a liquid crystal layer therebetween, a reflecting film for reflecting incident light from the other substrate, comprising:

• applying a photosensitive resin on said one of the substrates;
• in order to form asperities in a first region of the applied photosensitive resin film which do not extend all the way through the photosensitive resin and to form a contact hole in a second region of the applied photosensitive resin film, exposing at least part of the first region with various integrals of exposure amounts using a first photomask so that the photosensitive resin in the first region is left in respective different film thicknesses, and exposing at least part of the second region with an integral of exposure amount different from those for the first region using a second photomask, wherein each of said first and second photomasks comprise both light transmitting portions for transmitting illuminance and light intercepting portions for blocking illuminance from reaching the photosensitive resin so that the asperities and contact hole are formed based upon arrangement of the light transmitting portions and light intercepting portions in the photomasks;
• developing the exposed photosensitive resin;
• heat-treating the developed photosensitive resin;
• and
• forming a reflecting film on the heat-treated photosensitive resin so that the reflecting film is in electrical communication with a switching element through said contact hole.

A method of making a reflective liquid crystal display, the method comprising:

• applying a photosensitive resin to a substrate;
• forming asperities which do not extend all the way through the resin in a first region of the photosensitive resin by using a first photomask and exposing at least part of the first region using said first photomask;
• forming contact holes in a second region of the photosensitive resin using a second photomask different than the first photomask, and exposing at least part of the second region using said second photomask;
• developing the exposed photosensitive resin;
• heat treating the developed photosensitive resin;
• forming a reflective electrode on the heat treated photosensitive resin over asperities so that said reflective electrode is in communication with at least one switching element through at least one of the contact holes;
• and
• wherein each of said first and second photomasks comprise both light transmitting portions for transmitting illuminance and light intercepting portions for blocking illuminance from reaching the photosensitive resin so that the asperities and contact hole are formed based upon arrangement of the light transmitting portions and light intercepting portions in the photomasks.

A method for fabricating a reflection type liquid crystal display, comprising steps of:

• forming a switching element having a source, a drain, and a gate on an insulation substrate;
• depositing a photosensitive insulation film to a first thickness on the insulation substrate;
• performing a first exposure using a first mask including a light blocking portion and a light transmitting portion such that a first portion of the photosensitive insulation film is exposed for forming a contact hole proximate the drain;
• performing a second exposure using a second mask including a light blocking portion and a light transmitting portion such that a second portion of the photosensitive insulation film is exposed to a lesser amount of radiation than was the first portion in the first exposure;
• developing and removing the first exposed portion and the second exposed portion of the photosensitive insulation film;
• heating the photosensitive insulation film;
• and
• forming a reflection electrode on a selected portion of the photosensitive insulation film.

A method for fabricating a liquid crystal display, the method comprising:

• forming a transistor comprising a source, a drain, and a gate on a substrate;
• depositing a photosensitive insulation film on the substrate;
• performing a first exposure using a first mask including a light blocking portion and a light transmitting portion such that a first portion of the photosensitive insulation film is exposed for forming a contact hole proximate the drain;
• performing a second exposure using a second mask including a light blocking portion and a light transmitting portion such that a second portion of the photosensitive insulation film is exposed to a lesser amount of radiation than was the first portion in the first exposure;
• developing and removing the first exposed portion and the second exposed portion of the photosensitive insulation film;
• heating the photosensitive insulation film;
• and
• forming a reflection electrode on a selected portion of the photosensitive insulation film on the substrate.

A method for fabricating a liquid crystal display, the method comprising:

• depositing a photosensitive insulation film on a substrate;
• as part of forming a contact hole which extends all the way through the photosensitive insulation film, exposing part of the photosensitive insulation film using a first mask including a light blocking portion and a light transmitting portion;
• as part of forming asperities in a surface of the photosensitive insulation film which do not extend all the way through the photosensitive insulation film, exposing part of the photosensitive insulation film using a second mask including a light blocking portion and a light transmitting portion, wherein exposures using the first mask and the second mask, respectively, are of different exposure amounts;
• developing and removing parts of the photosensitive insulation film so as to form at least the contact hole and the asperities in the photosensitive insulation film;
• heating the photosensitive insulation film;
• and
• forming a reflection electrode on a selected portion of the photosensitive insulation film on the substrate, so that the reflection electrode is located over at least some of the asperities and is in electrical communication with the transistor via the contact hole.

A method for fabricating a liquid crystal display, the method comprising:

• depositing a photosensitive insulation film on a substrate;
• as part of forming at least one contact hole which extends all the way through the photosensitive insulation film, exposing part of the photosensitive insulation film using a first mask including a light blocking portion and a light transmitting portion;
• as part of forming asperities in the photosensitive insulation film which do not extend all the way through the photosensitive insulation film, exposing part of the photosensitive insulation film using a second mask including a light blocking portion and a light transmitting portion, wherein exposures using the first mask and the second mask, respectively, are of different exposure amounts;
• developing and removing parts of the photosensitive insulation film so as to form the at least one contact hole which extends all the way through the photosensitive insulation film as well as the asperities;
• and
• forming at least a first reflection electrode on a selected portion of the photosensitive insulation film, so that the first reflection electrode is located over at least some of the asperities and is in electrical communication with a transistor via one of the at least one contact hole.

A method of making a liquid crystal display apparatus including a liquid crystal layer between first and second substrates, a reflecting film provided on the first substrate for reflecting incident light, the method comprising:

• applying a positive photosensitive resin on the first substrate;
• exposing a first region of the photosensitive resin by using a photomask which has circular or polygonal shaped portions that are in a range of from 20% to 40% of the total area of said photomask, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the second region is higher than an integral of exposure amount to the first region;
• forming asperities in the first region by developing the first region, and forming a concave portion in the second region by developing the second region so that the concave portion has a thickness smaller than those of the first region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method of making a liquid crystal display apparatus including a liquid crystal layer between first and second substrates, a reflecting film provided on the first substrate for reflecting incident light, the method comprising:

• applying a positive photosensitive resin on the first substrate;
• exposing a first region of the photosensitive resin by using a photomask which has circular or polygonal shaped portions that are disposed so that center-to-center distances between adjoining circular or polygonal shaped regions are from 5 to 50 μm, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the second region is higher than an integral of exposure amount to the first region;
• forming asperities in the first region by developing the first region, and forming a concave portion in the second region by developing the second region so that the concave portion has a thickness smaller than those of the first region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method of making a liquid crystal display apparatus including a liquid crystal layer between first and second substrates, a reflecting film provided on the first substrate for reflecting incident light, the method comprising:

• applying a positive photosensitive resin on the first substrate;
• exposing a first region of the photosensitive resin by using a photomask which has light blocking portions that are in a range of from 20% to 40% of the total area of said photomask, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the second region is higher than an integral of exposure amount to the first region;
• forming asperities in the first region by developing the first region, and forming a concave portion in the second region by developing the second region so that the concave portion has a thickness smaller than those of the first region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method of making a liquid crystal display apparatus including, on one of a pair of substrates disposed so as to be opposed with a liquid crystal layer therebetween, a reflecting film for reflecting incident light, the method comprising:

• applying a positive photosensitive resin on one of the substrates;
• exposing a first region of the photosensitive resin by using a photomask which has light blocking portions that are disposed so that center-to-center distances between adjacent light blocking portions are from 5 to 50 μm, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the second region is higher than an integral of exposure amount to the first region;
• forming asperities in the first region by developing the first region, and forming a concave portion in the second region by developing the second region so that the concave portion has a thickness smaller than those of the first region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method of making a liquid crystal display apparatus including, on one of a pair of substrates disposed so as to be opposed with a liquid crystal layer therebetween, a reflecting film for reflecting incident light, the method comprising:

• applying a negative photosensitive resin on one of the substrates;
• exposing a first region of the photosensitive resin by using a photomask which has circular or polygonal shaped portions that are in a range of from 20% to 40% of the total area of said photomask, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the first region is higher than an integral of exposure amount to the second region;
• forming asperities in the first region by developing the first region, and removing the photosensitive resin in the second region by developing the second region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method of making a liquid crystal display apparatus including, on one of a pair of substrates disposed so as to be opposed with a liquid crystal layer therebetween, a reflecting film for reflecting incident light, the method comprising:

• applying a negative photosensitive resin on one of the substrates;
• exposing a first region of the photosensitive resin by using a photomask which has circular or polygonal shaped portions that are disposed so that center-to-center distances between adjacent circular or polygonal shaped portions are in a range of from 5 to 50 μm, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the first region is higher than an integral of exposure amount to the second region;
• forming asperities in the first region by developing the first region, and removing the photosensitive resin in the second region by developing the second region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method of making a liquid crystal display apparatus including, on one of a pair of substrates disposed so as to be opposed with a liquid crystal layer therebetween, a reflecting film for reflecting incident light, the method comprising:

• applying a negative photosensitive resin on one of the substrates;
• exposing a first region of the photosensitive resin by using a photomask which has light transmitting portions which collectively have an area of from 20% to 40% of the total area of said photomask, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the first region is higher than an integral of exposure amount to the second region;
• forming asperities in the first region by developing the first region, and removing the photosensitive resin in the second region by developing the second region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method of making a liquid crystal display apparatus including, on one of a pair of substrates disposed so as to be opposed with a liquid crystal layer therebetween, a reflecting film for reflecting incident light, the method comprising:

• applying a negative photosensitive resin on one of the substrates;
• exposing a first region of the photosensitive resin by using a photomask which has light transmitting portions that are disposed so that center-to-center distances between adjacent light transmitting portions are in a range of from 5 to 50 μm, and exposing a second region of the photosensitive resin so that an integral of exposure amount to the first region is higher than an integral of exposure amount to the second region;
• forming asperities in the first region by developing the first region, and removing the photosensitive resin in the second region by developing the second region;
• heat-treating the developed photosensitive resin;
• and
• forming the reflecting film on the heat-treated photosensitive resin.

A method for fabricating a reflection type liquid crystal display, comprising steps of:

• forming a switching element having a source, a drain, and a gate on an insulation substrate;
• depositing a photosensitive organic insulation film to a first thickness onto the insulation substrate;
• performing a first exposure for a first time period using a first mask such that the photosensitive organic insulation film on a portion of the drain is completely exposed;
• performing a second exposure for a second time period using a second mask such that the photosensitive organic insulation film is exposed to a depth shallower than that of the first exposure;
• developing and removing the first exposed portion and the second exposed portion;
• heating the photosensitive organic insulation film;
• and
• forming a reflection electrode onto a selected portion of the photosensitive organic insulation film.

A method for fabricating a liquid crystal display, the method comprising:

• depositing a negative photosensitive insulation film on a substrate;
• as part of forming a contact hole which extends all the way through the photosensitive insulation film, exposing part of the negative photosensitive insulation film using a first mask including a light blocking portion and a light transmitting portion;
• as part of forming asperities in a surface of the photosensitive insulation film which do not extend all the way through the photosensitive insulation film, exposing part of the negative photosensitive insulation film using a second mask including a light blocking portion and a light transmitting portion, wherein exposures using the first mask and the second mask, respectively, are of different exposure amounts;
• developing and removing parts of the negative photosensitive insulation film so as to form at least the contact hole and the asperities in the photosensitive insulation film;
• heating the photosensitive insulation film;
• and
• forming a reflection electrode on a selected portion of the photosensitive insulation film on the substrate, so that the reflection electrode is located over at least some of the asperities and is in electrical communication with a transistor via the contact hole.

A manufacturing method for a reflection type liquid crystal display having a reflection film for reflecting light having passed through a liquid crystal layer, the method comprising:

• forming a thin film transistor on a substrate;
• forming a photosensitive resin film on the thin film transistor;
• exposing the photosensitive resin film with a first unit exposure light amount via a first mask;
• exposing the photosensitive resin film with a second unit exposure light amount via a second mask;
• developing the photosensitive resin film subjected to two exposures thereby forming two types of concaves having different depths;
• and
• forming a film using a reflective material on the photosensitive resin developed to have two types of concaves, thereby forming the reflection film;
• wherein the photosensitive resin film constitutes an insulating film, the reflection film is a reflection electrode having a size corresponding to a pixel, and
• the reflection electrode is electrically connected to the thin film transistor, and
• wherein the first unit exposure light amount is larger than the second unit exposure light amount,
• the concave formed using the first mask constitutes a contact hole for electrically connecting the reflection electrode and the thin film transistor, and
• the concave formed using the second mask constitutes a concave formed on a surface of the reflection electrode.

A manufacturing method for a reflection type liquid crystal display having a reflection film for reflecting light having passed through a liquid crystal layer, the method comprising:

• forming a thin film transistor on a substrate;
• forming a photosensitive resin film on the thin film transistor;
• exposing the photosensitive resin film with a first unit exposure light amount via a first mask;
• exposing the photosensitive resin film with a second unit exposure light amount via a second mask;
• developing the photosensitive resin film subjected to two exposures thereby forming two types of concaves having different depths;
• and
• forming a film using a reflective material on the photosensitive resin developed to have two types of concaves, thereby forming the reflection film;
• wherein the photosensitive resin film constitutes an insulating film, the reflection film is a reflection electrode having a size corresponding to a pixel, and
• the reflection electrode is electrically connected to the thin film transistor, and
• wherein the second unit exposure light amount is larger than the first unit exposure light amount,
• the concave formed using the first mask constitutes a concave formed on a surface of the reflection electrode, and
• the concave formed using the second mask constitutes a contact hole for electrically connecting the reflection electrode and the thin film transistor.

A manufacturing method for a reflection type liquid crystal display having a plurality of reflection electrodes for reflecting light having passed through a liquid crystal layer, the method comprising:

• forming a lower conductive film on a substrate;
• forming a photosensitive resin film on a thin film transistor;
• exposing the photosensitive resin film with a first unit exposure light amount via a first mask and exposing the photosensitive resin film with a second unit exposure light amount which is greater than the first unit exposure light amount via a second mask at a different timing;
• developing the photosensitive resin film subjected to two exposures to simultaneously form a contact hole and a concave on a surface;
• and
• forming a film using a reflective material on the photosensitive resin film to thereby form the reflection electrodes;
• wherein the reflection electrodes connect with the lower conductive film via the contact hole and have a concave on a surface due to the concave of the photosensitive resin film.