Shadow mask for cathode ray tube having an aperture area in which a curvature of radii in the horizontal and vertical directions satisfy a particular condition
AssigneeSamsung SDI Co., Ltd.
InventorsSang-Ho Jeon, Do-Hun Pyun
Life of this patent
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Abstract
A shadow mask for a cathode ray tube includes an aperture area having a plurality of apertures passing electron beams, a non-aperture area extending a predetermined distance from a circumference of the aperture area and a skirt extending a predetermined distance from an outside circumference of the non-aperture area and bent at a predetermined angle to the non-aperture area, wherein the aperture area has predetermined curvature radii, and wherein if a curvature radius in a horizontal direction of the aperture area is Rhs, and a curvature radius in a vertical direction is Rvs, the following condition is satisfied, 0.6<Rvs/Rhs<0.8.
Claims13
A shadow mask for a cathode ray tube, comprising:
- an aperture area having a plurality of apertures passing electron beams;
- a non-aperture area extending a predetermined distance from a circumference of the aperture area;
- and
- a skirt extending a predetermined distance from an outside circumference of the non-aperture area and bent at a predetermined angle to the non-aperture area, wherein the aperture area has predetermined curvature radii, and wherein if a curvature radius in a horizontal direction of the aperture area is Rhs, and a curvature radius in a vertical direction is Rvs, the following condition is satisfied,
- 0.6<Rvs/Rhs<0.8.
A display system, comprising:
- a panel having a substantially flat outer surface, a curved inner surface, and a phosphor screen on the inner surface;
- a shadow mask having a horizontal curvature radius (Rhs) and a vertical curvature radius (Rvs) positioned near the panel to direct electron beams to particular positions on the panel, wherein the following condition is satisfied,
- 0.6<Rvs/Rhs<0.8.
A shadow mask for a cathode ray tube, comprising:
- an aperture area having a plurality of apertures passing electron beams;
- a non-aperture area extending a predetermined distance from a circumference of the aperture area;
- and
- a skirt extending a predetermined distance from an outside circumference of the non-aperture area and bent at a predetermined angle to the non-aperture area, wherein the aperture area has predetermined curvature radii, and wherein if a curvature radius in a horizontal direction of the aperture area is Rhs, and a curvature radius in a vertical direction is Rvs, Rvs/Rhs is approximately 0.7.
Dependencies are inferred from the claim text.