Magnetic disk and method of manufacturing same

A magnetic disk comprising a magnetic layer, a carbon-base protective layer, and a lubricating layer on a substrate, said lubricating layer including —COOH and/or —CF2COOH atomic groups, in which the lubricating layer has been formed on the carbon-base protective layer, said lubricating layer being comprised of a lubricant c,

• said lubricant c comprising:
• a lubricant a having a weight average molecular weight (Mw) of from 3,000 to 7,000 and a molecular weight dispersion of less than or equal to 1.2 obtained by refining a lubricant alpha comprising the compound denoted by the chemical formula
• HO—CH2—CH(OH)—CH2—O—CH2—CF2(—O—C2F4)p-(O—CF2)q-O—CF2—CH2—O—CH2—CH(OH)—CH2—OH [Chem. 4]
• wherein p and q are natural number,
• and a compound denoted by chemical formula
• HO—CH2—CF2(—O—C2F4)m-(O—CF2)n-O—CF2—CH2—OH [Chem. 5]
• wherein m and n are natural number,
• and a lubricant b having a weight average molecular weight (Mw) of from 2,000 to 5,000 and a molecular weight dispersion of less than or equal to 1.2, comprising a lubricant beta comprising a compound denoted by chemical formula
• HO—CH2—CF2(—O—C2F4)m-(O—CF2)n-O—CF2—CH2—OH [Chem. 6]
• wherein m and n are natural number.

A magnetic disk comprising a magnetic layer, a carbon-base protective layer, and a lubricating layer on a substrate, in which the lubricating layer has been formed on the carbon-base protective layer, said lubricating layer comprising a compound denoted by the chemical formula

• HO—CH2—CH(OH)—CH2—O—CH2—CF2(—O—C2F4)p-(O—CF2)q-O—CF2—CH2—O—CH2—CH(OH)—CH2—OH [Chem. 7]
• wherein p and q are natural number,
• and a compound denoted by the chemical formula
• HO—CH2—CF2(—O—C2F4)m-(O—CF2)n-O—CF2—CH2—OH [Chem. 8]
• wherein m and n are natural number,
• and the lubricating layer contains —COOH atomic groups detectable by time of flight secondary ion mass spectrometry.

A magnetic disk comprising a magnetic layer, a carbon-base protective layer, and a lubricating layer on a substrate, in which the lubricating layer comprises:

• a compound denoted by the chemical formula
• HO—CH2—CH(OH)—CH2—O—CH2—CF2(—O—C2F4)p-(O—CF2)q-O—CF2—CH2—O—CH2—CH(OH)—CH2—OH [Chem. 9]
• wherein p and q are natural number,
• a compound denoted by the chemical formula
• HO—CH2—CF2(—O—C2F4)m-(O—CF2)n-O—CF2—CH2—OH [Chem. 10]
• wherein m and n are natural number,
• and a compound having in its molecular structure —COOH atomic group detectable by time of flight secondary ion mass spectrometry.