Programmable structure including an oxide electrolyte and method of forming programmable structure
AssigneeAxon Technologies Corporation
InventorsMichael N. Kozicki, Maria Mitkova, Chakravarthy Gopalan, Muralikrish Balakrishnan
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Abstract
A microelectronic programmable structure suitable for storing information and methods of forming and programming the structure are disclosed. The programmable structure generally includes an oxide ion conductor and a plurality of electrodes. Electrical properties of the structure may be altered by applying energy to the structure, and thus information may be stored using the structure.
Claims32
A microelectronic programmable structure comprising:
- an insulating layer having a via formed therein;
- an ion conductor comprising an oxide electrolyte and conductive material;
- an oxidizable electrode proximate the ion conductor;
- and
- an indifferent electrode proximate the ion conductor;
- wherein at least one of the ion conductor, oxidizable electrode, and indifferent electrode is formed within at least a portion of the via.
A method of forming a programmable microelectronic device, the method comprising the steps of:
- providing a substrate;
- forming a first insulating layer overlying the substrate;
- forming a second insulating layer overlying the first insulating layer;
- forming a via within the second insulating layer;
- filling the via with first electrode material;
- removing any excess first electrode material;
- forming an ion conductor overlying the first electrode material;
- and
- forming a second electrode material overlying the ion conductor.
A method of forming a programmable microelectronic device, the method comprising the steps of:
- providing a substrate;
- forming a first insulating layer overlying the substrate;
- forming a first electrode overlying the first insulating layer;
- forming an ion conductor overlying the first electrode material;
- wherein the step of forming an ion conductor comprises exposing the first electrode to an oxidizing atmosphere to form an oxide ion conductor;
- forming a second insulating layer overlying the first insulating layer;
- forming a via within the second insulating layer;
- and
- filling at least a portion of the via with second electrode material.
A method of forming a programmable microelectronic device, the method comprising the steps of:
- providing a substrate;
- forming a first insulating layer overlying the substrate;
- forming a first electrode overlying the first insulating layer;
- forming an ion conductor overlying the first electrode material;
- wherein the step of forming an ion conductor comprises exposing the first electrode material to a wet chemical oxidation process;
- forming a second insulating layer overlying the first insulating layer;
- forming a via within the second insulating layer;
- and
- filling at least a portion of the via with second electrode material.
Dependencies are inferred from the claim text.