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AssigneeAdvanced LCD Technologies Development Center Co., Ltd.
InventorsYukio Taniguchi, Masakiyo Matsumura, Hirotaka Yamaguchi, Mikihiko Nishitani, Susumu Tsujikawa, Yoshinobu Kimura, Masayuki Jyumonji
Estimating the term…
A crystallization apparatus includes an optical illumination system to illuminate a phase shift mask and which irradiates an amorphous semiconductor film with a light beam having an inverse peak type light intensity distribution including a minimum light intensity in a point corresponding to a phase shift portion of the phase shift mask to produce a crystallized semiconductor film. A wavefront dividing element is disposed on a light path between the optical illumination system and the phase shift mask. The wavefront dividing element wavefront-divides the light beam supplied from the optical illumination system into a plurality of light beams, and condenses the wavefront-divided light beams in the corresponding phase shift portion or in the vicinity of the portion.
A crystallization apparatus which comprises an optical illumination system to emit a light beam onto a non-crystallized semiconductor film and which irradiates the non-crystallized semiconductor film with the light beam to crystallize the non-crystallized semiconductor film, the apparatus comprising:
A crystallization apparatus comprising:
A crystallization apparatus comprising:
A crystallization apparatus comprising:
Dependencies are inferred from the claim text.