Negative resist composition

A negative resist composition, comprising;

• (a) 3 to 40 parts by weight of a binder resin consisting of copolymers of monomers including monomers of the following i) to iv);
• i) 10 to 50 mol % of an acid including an unsaturated group having 3 to 10 carbon atoms, an acid anhydrides including the unsaturated group, or a mixture thereof,
• ii) 5 to 50 mol % of a (meth)acrylic acid derivative substituted with an epoxy group having 3 to 10 carbon atoms,
• iii) 1 to 35 mol % of a (meth)acrylic acid derivative substituted with a linear alkyl group having 7 to 16 carbon atoms, and
• iv) 5 to 55 mol % of a (meth)acrylic acid derivative substituted with an alkyl group having 1 to 6 carbon atoms, or a compound including 4 to 14 carbon atoms having an unsaturated double bond, which is selected from the group consisting of methyl(meth)acrylate, ethyl(meth)acrylate, propyl(meth)acrylate, butyl(meth)acrylate, pentyl(meth)acrylate, hexyl(meth)acrylate, cyclohexyl(meth)acrylate, isobonyl(meth)acrylate, adamantyl(meth)acrylate, dicyclopentanyl(meth)acrylate, dicyclopentenyl(meth)acrylate, benzyl(meth)acrylate, 2-methoxyethyl(meth)acrylate, 2-ethoxyethyl(meth)acrylate, styrene, α-methylstyrene, acetoxystyrene, N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide, N-butylmaleimide, N-cyclohexylmaleimide, (meth)acrylamide and N-methyl(meth)acrylamide;
• (b) 1 to 40 parts by weight of a (meth)acryl monomer including at least three (meth)acryl groups;
• (c) 1 to 40 parts by weight of a (meth)acryl monomer including one or two (meth)acryl groups;
• and
• (d) 0.01 to 10 parts by weight of a photo-initiator.