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US 7,095,544 B2Granted
Micromirror and products using the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChih-Chieh Yeh, Yuh-Hwa Chang, Ching-Heng Po, Hsin-Chieh Huang, Jiann-Tyng Tzeng
Life of this patent
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Abstract
A product comprising a micromirror comprising a reflective layer and a treatment layer overlying the reflective layer, and wherein the treatment layer comprises Ti.
Claims10
A product comprising:
- a micromirror comprising a reflective layer, a treatment layer overlying the reflective layer, and
- a first protective layer that comprises plasma enhanced silicon oxide wherein the reflective layer overlies the first protective layer.
A product comprising:
- a micromirror comprising a reflective layer and a first protective layer overlying a first face of the reflective layer and a second protective layer overlying a second face of the reflective layer, and wherein the second protective layer comprises plasma enhance silicon dioxide having a thickness ranging from 200–1000 A.
Dependencies are inferred from the claim text.