Semiconductor device and method of manufacturing the same
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsTatsuya Arao, Hideomi Suzawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsTatsuya Arao, Hideomi Suzawa
Estimating the term…
To realize the reduction of a manufacturing cost and the enhancement of yield by reducing the number of steps of a TFT in an electro-optical device typified by an active matrix liquid crystal display device. A semiconductor device of the present invention is characterized by including a first wiring and a second wiring formed of a first conductive film on the same insulating surface, a first semiconductor film of one conductivity type formed on the first and second wirings so as to correspond thereto, a second semiconductor film formed on an upper layer of the first semiconductor film of one conductivity type across the first wiring and the second wiring, an insulating film formed on the second semiconductor film, and a third conductive film formed on the insulating film.
A TV receiver comprising:
A TV receiver comprising:
A TV receiver comprising:
A TV receiver comprising:
A TV receiver comprising:
A TV receiver comprising:
A personal computer comprising:
A personal computer comprising:
A personal computer comprising:
A personal computer comprising:
A personal computer comprising:
A personal computer comprising:
Dependencies are inferred from the claim text.