Electron beam lithography system having improved electron gun
OwnerAndres Fernadez, Marian Mankos +2inventors
InventorsAndres Fernadez, Marian Mankos, Jeffrey S. Sullivan, Paul C. Allen
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Abstract
An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.
Claims30
An electron beam lithography system, comprising:
- an electron gun, said electron gun comprising:
- at least one laser;
- and
- a photocathode substantially comprising cesium telluride and adapted to be activated to generate electrons by said at least one laser and to be regenerated by exposure of at least one surface of said photocathode to radiation generated from said at least one laser.
A method for electron beam lithography, comprising:
- applying at least one laser in a first mode to a cesium telluride photocathode for generating electrons;
- and
- applying said at least one laser to said cesium telluride photocathode in a second mode to regenerate said cesium telluride photocathode.
An electron gun, comprising:
- at least one laser;
- and
- a photocathode adapted to be activated to generate electrons by said at least one laser and to be regenerated by exposure of at least one surface of a photocathode to radiation generated from said at least one laser.
A method, comprising:
- providing at least one laser;
- and
- providing a photocathode adapted to be activated to generate electrons by said at least one laser and to be regenerated by exposure of at least one surface of said photocathode to radiation generated from said at least one laser.
An electron beam lithography system, comprising:
- an electron column;
- and
- an electron gun;
- wherein said electron gun is adapted to apply at least one laser in a first mode to a cesium telluride photocathode for generating electrons;
- and
- said electron gun is adapted to apply said at least one laser to at least one surface of said cesium telluride photocathode in a second mode to regenerate said cesium telluride photocathode.
A controller for an electron beam lithography system, said controller adapted to control application of at least one laser to a photocathode in a first mode for generating electrons and in a second mode for regenerating said photocathode.
Dependencies are inferred from the claim text.