Electron beam lithography apparatus using a patterned emitter and method of fabricating the patterned emitter

An electron beam lithography apparatus for providing an x-to-one projection of a pattern, comprising:

• a pyroelectric emitter, which is disposed a predetermined distance apart from a substrate holder, the pyroelectric emitter including a pyroelectric plate having a dielectric plate on a surface thereof and a patterned semiconductor thin film on the dielectric plate facing the substrate holder;
• a heating source for heating the pyroelectric emitter;
• and
• a deflection unit disposed between the pyroelectric emitter and the substrate holder to control paths of electrons emitted by the pyroelectric emitter.

A method of fabricating an electron beam lithography apparatus, comprising:

• preparing a pyroelectric plate;
• preparing a patterned mask of a semiconductor material, including sequentially forming a semiconductor thin film having a predetermined thickness and a resist on a dielectric plate having the predetermined thickness, patterning the resist in a predetermined pattern, patterning the semiconductor thin film using the patterned resist as a mask, and removing the patterned resist, the semiconductor material being sufficiently thick in desired portions to prevent electrons emitted by the pyroelectric plate during heating from being further transmitted;
• disposing the patterned mask adjacent the surface of the pyroelectric plate;
• providing a heating source for heating the pyroelectric emitter;
• and
• providing a pair of magnets disposed beyond the pyroelectric emitter and the substrate holder, respectively, to control paths of electrons emitted by the pyroelectric emitter.