Substrate treatment method and substrate treatment apparatus

A substrate treatment method in which a treatment by supplying a treatment solution to a substrate is successively performed for a plurality of substrates, comprising the step of:

• performing a pre-dispense of the treatment solution at a break between lots of the substrates,
• wherein the step of performing the pre-dispense is performed only when the kind of the supplied treatment solution is changed between the lots and
• wherein the substrate treatment method is performed by a treatment apparatus by supplying the treatment solution to the substrate, the treatment apparatus including:
• a treatment solution supply mechanism for supplying the treatment solution and performing a pre-dispense of the treatment solution;
• and
• a main controller for controlling the pre-dispense,
• wherein the main controller controls discharge amounts and start conditions of a plurality of pre-dispenses,
• wherein the main controller has a measuring unit,
• wherein the measuring unit measures an integrated time from the time of a preceding pre-dispense or the time of a preceding reset, for each of the pre-dispenses, and
• wherein the main controller conducts a control such that
• each of the pre-dispenses is performed when the integrated time reaches a predetermined set time,
• the plurality of pre-dispenses are given priority levels,
• when the pre-dispense at a high priority level is performed, the integrated time of the pre-dispense at a priority level lower than that is reset, and when the pre-dispense at a low priority level is performed, the integrated time of the pre-dispense at a priority level higher than that is not reset.

A treatment apparatus for performing a treatment by supplying a treatment solution to a substrate, comprising:

• a treatment solution supply mechanism for supplying the treatment solution and performing a pre-dispense of the treatment solution;
• and
• a main controller for controlling the pre-dispense,
• wherein, the main controller controls discharge amounts and start conditions of a plurality of pre-dispenses,
• wherein the main controller has a measuring unit,
• wherein the measuring unit measures an integrated time from a of a preceding pre-dispense or a time of a preceding reset, for each of the pre-dispenses, and
• wherein the main controller controls in a manner such that
• each of the pre-dispenses is performed when the integrated time reaches a predetermined set time,
• the plurality of pre-dispenses are given priority levels,
• when the pre-dispense at a high priority level is performed, the integrated time of the pre-dispense at a priority level lower than that is reset, and
• when the pre-dispense at a low priority level is performed, the integrated time of the pre-dispense at a priority level higher than that is not reset.

A treatment apparatus for performing a treatment by supplying a treatment solution to a substrate, comprising:

• a treatment solution supply mechanism for supplying the treatment solution and performing a pre-dispense of the treatment solution;
• and
• a main controller for controlling the pre-dispense,
• wherein, the main controller controls discharge amounts an start conditions of a plurality of pre-dispenses,
• wherein the main controller has a measuring unit,
• wherein the measuring unit measures an integrated number of treated substrates from a time of a preceding pre-dispense or a time of a preceding reset, for each of the pre-dispenses, and
• wherein the main controller controls in a manner such that
• each of the pre-dispenses is performed when the integrated number of treated substrates reaches a predetermined set number of substrates,
• the plurality of pre-dispenses are given priority levels,
• when the pre-dispense at a high priority level is performed, the integrated number of treated substrates of the pre-dispense at a priority level lower than that is reset, and
• when the pre-dispense at a low priority level is performed, the integrated number of treated substrates of the pre-dispense at a priority level higher than that is not reset.