Multi-pin pin seam for an industrial fabric
AssigneeAlbany International Corp.
InventorsLuc Canon, Jean-Louis Monnerie
Life of this patent
Estimating the term…
Abstract
The present invention relates to a multi-pin pin seam used to join the a woven fabric wherein the loops are made around three or more cross-machine CD pins or pintles. Advantageously, this arrangement results in the seam area having a weave pattern that more closely conforms to that of the fabric body, and thus the risk of sheet marking and/or fabric abrasion in the seam area is reduced or eliminated.
Claims15
A woven fabric comprising a fabric body having a weave pattern made from a plurality of cross-machine direction (CD) yarns, and plurality of machine direction (MD) yarns extending between two opposite ends of the fabric, the MD yarns being looped around three or more CD pins or pintles in a seam area, the woven fabric comprising:
- a first row of MD yarns being looped around a first of said pintles adjacent to a third row of MD yarns from the opposite fabric end being looped around the first of said pintles,
- a second row of MD yarns being looped around a second of said pintles adjacent to a second row of MD yarns from the opposite fabric end being looped around the second of said pintles,
- a third row of MD yarns being looped around a third of said pintles adjacent to a first row of MD yarns from the opposite fabric end being looped around the third of said pintles,
- so as to create a seam such that a weave pattern in said seam area conforms more closely to that of the weave pattern in the fabric body.
A woven fabric comprising two layers of a plurality of cross-machine direction (CD) yarns, and a plurality of machine direction (MD) yarns extending between two opposite ends of the fabric to create the fabric body, the woven fabric comprising:
- at least four pintles in a seam area, wherein a first and third of the pintles are disposed adjacently in a direction and plane of a first layer of CD yarns, and a second and fourth of the pintles are disposed adjacently in a direction and plane of a second layer of CD yarns,
- a first row of MD yarns, the MD yarns being looped around a first and second of said pintles at one fabric end, and said first row of MD yarn being looped around a third and fourth of said pintles at the other fabric end, and
- a second row of MD yarns adjacent to said first row, the second row of MD yarns being looped around the third and fourth pintles at the one fabric end, and the second row of MD yarns being looped around the first and second pintles at the other fabric end,
- so to create a seam such that a weave pattern in said seam area more closely conforms to a weave pattern of the fabric.
Dependencies are inferred from the claim text.