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AssigneesMolecular Imprints, Inc., Board of Regents, The University of Texas System
InventorsIan M. McMackin, Nicholas A. Stacey, Daniel A. Babbs, Duane J. Voth, Michael P. C. Watts, Van N. Truskett, Frank Y. Xu, Ronald D. Voisin, Pankaj B. Lad
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The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
A method for reducing gases present in viscous liquid deposited on a substrate, said method comprising:
A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
A method for reducing gases present in a viscous liquid deposited on a substrate, said method comprising:
Dependencies are inferred from the claim text.